Izuta; Nobuhiko
Patent Applications and Registrations
Patent applications and USPTO patent grants for Izuta; Nobuhiko.The latest application filed is for "regeneration method of etching solution, an etching method and an etching system".
- Izuta; Nobuhiko - Okayama JP
- Izuta; Nobuhiko - Okayama-shi JP
- Izuta; Nobuhiko - Tokyo JP
| Patent | Date |
|---|---|
| Regeneration method of etching solution, an etching method and an etching system Grant 7,964,108 - Izuta , et al. June 21, 2 | 2011-06-21 |
| Equipment and method for measuring silicon concentration in phosphoric acid solution Grant 7,713,478 - Watatsu , et al. May 11, 2 | 2010-05-11 |
| Regeneration method of etching solution, an etching method and an etching system App 20080087645 - Izuta; Nobuhiko ; et al. | 2008-04-17 |
| Regeneration process of etching solution, etching process, and etching system Grant 7,238,295 - Izuta , et al. July 3, 2 | 2007-07-03 |
| Equipment and method for measuring silicon concentration in phosphoric acid solution App 20060263251 - Watatsu; Haruru ; et al. | 2006-11-23 |
| Regeneration process of etching solution, etching process, and etching system App 20040200806 - Izuta, Nobuhiko ; et al. | 2004-10-14 |
| Method and apparatus for etching silicon Grant 6,444,589 - Yoneya , et al. September 3, 2 | 2002-09-03 |
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