Izawa; Junji
Patent Applications and Registrations
Patent applications and USPTO patent grants for Izawa; Junji.The latest application filed is for "production of high-purity polycrystalline silicon rod for semiconductor applications".
- Izawa; Junji - Hadano JP
- Izawa; Junji - Kanagawa JP
- Izawa; Junji - Hiratsuka JP
| Patent | Date |
|---|---|
| Production of high-purity polycrystalline silicon rod for semiconductor applications Grant RE36,936 - Keck , et al. October 31, 2 | 2000-10-31 |
| Production of high-purity polycrystalline silicon rod for semiconductor applications Grant 5,545,387 - Keck , et al. August 13, 1 | 1996-08-13 |
| Production of high-purity polycrystalline silicon rod for semiconductor applications Grant 5,478,396 - Keck , et al. December 26, 1 | 1995-12-26 |
| Production of high-purity polycrystalline silicon rod for semiconductor applications Grant 5,382,419 - Nagai , et al. January 17, 1 | 1995-01-17 |
| Method of producing high-purity transparent vitreous silica body Grant 4,113,844 - Tokimoto , et al. September 12, 1 | 1978-09-12 |
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