Izaki; Kansei

Patent Applications and Registrations

Patent applications and USPTO patent grants for Izaki; Kansei.The latest application filed is for "method of processing discharge gas discharged from production process".

Company Profile

0.5.3

Izaki; Kansei - Kanagawa JP
Izaki; Kansei - Niigata JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of processing discharge gas discharged from production process Grant 9,815,707 - Izaki , et al. November 14, 2	2017-11-14
Method Of Processing Discharge Gas Discharged From Production Process App 20160101987 - IZAKI; Kansei ; et al.	2016-04-14
Method of recovering ammonia and method of recycling ammonia by using the same Grant 8,889,090 - Izaki , et al. November 18, 2	2014-11-18
Method Of Processing Discharge Gas Discharged From Production Process Of Gallium Nitride Compound Semiconductor App 20140322124 - IZAKI; Kansei ; et al.	2014-10-30
Method Of Recovering Ammonia And Method Of Recycling Ammonia By Using The Same App 20130312456 - IZAKI; Kansei ; et al.	2013-11-28
Silicon nitride-silicon carbide composite material and process for production thereof Grant 5,134,097 - Niihara , et al. July 28, 1	1992-07-28
Silicon nitride-silicon carbide composite material and process for production thereof Grant 4,800,182 - Izaki , et al. January 24, 1	1989-01-24
Fine amorphous powder and process for preparing fine powdery mixture of silicon nitride and silicon carbide Grant 4,594,330 - Suzuki , et al. June 10, 1	1986-06-10

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