Iyer; R. Suryanarayanan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Iyer; R. Suryanarayanan.The latest application filed is for "rotating substrate support and methods of use".

Company Profile

0.11.22

Iyer; R. Suryanarayanan - Santa Clara CA US
Iyer; R. Suryanarayanan - St. Paul MN
Iyer; R. Suryanarayanan - Edina MN

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi-zone resistive heater Grant 9,892,941 - Cui , et al. February 13, 2	2018-02-13
Rotating Substrate Support And Methods Of Use App 20100224130 - Smith; Jacob ; et al.	2010-09-09
Multi-Zone Resistive Heater App 20090314762 - Cui; Anqing ; et al.	2009-12-24
Method for treating substrates and films with photoexcitation Grant 7,601,652 - Singh , et al. October 13, 2	2009-10-13
Method For Silicon Based Dielectric Chemical Vapor Deposition App 20090111284 - Wang; Yaxin ; et al.	2009-04-30
Silicon nitride film with stress control Grant 7,488,690 - Iyer , et al. February 10, 2	2009-02-10
Method for silicon based dielectric chemical vapor deposition Grant 7,473,655 - Wang , et al. January 6, 2	2009-01-06
Method of fabricating a silicon nitride stack Grant 7,465,669 - Iyer , et al. December 16, 2	2008-12-16
Method Of Poly-silicon Grain Structure Formation App 20080246101 - Li; Ming ; et al.	2008-10-09
Method for fabricating controlled stress silicon nitride films Grant 7,416,995 - Iyer , et al. August 26, 2	2008-08-26
Substrate Heating Method And Apparatus App 20080197125 - CUI; ANQING ; et al.	2008-08-21
METHOD AND APPARATUS FOR LOW TEMPERATURE AND LOW K SiBN DEPOSITION App 20080145536 - ZHANG; KANGZHAN ; et al.	2008-06-19
Low Thermal Budget Chemical Vapor Deposition Processing App 20080119059 - Smith; Jacob W. ; et al.	2008-05-22
Method for silicon nitride chemical vapor deposition Grant 7,365,029 - Iyer , et al. April 29, 2	2008-04-29
Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysilicon Grant 7,341,907 - Li , et al. March 11, 2	2008-03-11
Method for fabricating silicon nitride spacer structures Grant 7,294,581 - Iyer , et al. November 13, 2	2007-11-13
Multi-zone resistive heater App 20070125762 - Cui; Anqing ; et al.	2007-06-07
Method of fabricating a silicon nitride stack App 20070111538 - Iyer; R. Suryanarayanan ; et al.	2007-05-17
Method for fabricating controlled stress silicon nitride films App 20070111546 - Iyer; R. Suryanarayanan ; et al.	2007-05-17
Method for fabricating silicon nitride spacer structures App 20070087575 - Iyer; R. Suryanarayanan ; et al.	2007-04-19
Method and apparatus for the low temperature deposition of doped silicon nitride films App 20070082507 - Iyer; R. Suryanarayanan ; et al.	2007-04-12
Method for treating substrates and films with photoexcitation App 20060286820 - Singh; Kaushal K. ; et al.	2006-12-21
Method for silicon based dielectric chemical vapor deposition App 20060286818 - Wang; Yaxin ; et al.	2006-12-21
Method for silicon based dielectric deposition and clean with photoexcitation App 20060286819 - Seutter; Sean M. ; et al.	2006-12-21
Rotating substrate support and methods of use App 20060281310 - Smith; Jacob ; et al.	2006-12-14
Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysilicon App 20060223333 - Li; Ming ; et al.	2006-10-05
Apparatus and method for the deposition of silicon nitride films App 20060102076 - Smith; Jacob W. ; et al.	2006-05-18
Silicon nitride film with stress control App 20060009041 - Iyer; R. Suryanarayanan ; et al.	2006-01-12
Method for silicon nitride chemical vapor deposition App 20050255714 - Iyer, R. Suryanarayanan ; et al.	2005-11-17
Thermal chemical vapor deposition of silicon nitride using BTBAS bis(tertiary-butylamino silane) in a single wafer chamber App 20050109276 - Iyer, R. Suryanarayanan ; et al.	2005-05-26
Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposion chamber Grant 6,884,464 - Luo , et al. April 26, 2	2005-04-26
Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposion chamber App 20040086640 - Luo, Lee ; et al.	2004-05-06

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