Iwato; Kaoru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Iwato; Kaoru.The latest application filed is for "method of forming pattern".

Company Profile

4.68.73

Iwato; Kaoru - Shizuoka JP
Iwato; Kaoru - Shizuoka-ken JP
Iwato; Kaoru - Haibara-gun JP
- Shizuoka JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film Grant 10,248,019 - Kataoka , et al.	2019-04-02
Pattern forming method and resist composition Grant 10,126,653 - Iwato , et al. November 13, 2	2018-11-13
Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device Grant 9,915,870 - Takizawa , et al. March 13, 2	2018-03-13
Method of forming pattern and developer for use in the method Grant 9,897,922 - Enomoto , et al. February 20, 2	2018-02-20
Pattern forming method and actinic-ray- or radiation-sensitive resin composition Grant 9,760,003 - Iwato , et al. September 12, 2	2017-09-12
Resin composition and pattern forming method using the same Grant 9,718,901 - Tsuruta , et al. August 1, 2	2017-08-01
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same Grant 9,709,892 - Kataoka , et al. July 18, 2	2017-07-18
Method Of Forming Pattern App 20170102618 - KATO; Keita ; et al.	2017-04-13
Pattern forming method and resist composition Grant 9,551,935 - Kato , et al. January 24, 2	2017-01-24
Method Of Forming Pattern And Developer For Use In The Method App 20160349620 - ENOMOTO; Yuichiro ; et al.	2016-12-01
Method of forming pattern and developer for use in the method Grant 9,482,958 - Enomoto , et al. November 1, 2	2016-11-01
Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern Grant 9,454,079 - Shibuya , et al. September 27, 2	2016-09-27
Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device Grant 9,448,482 - Iwato , et al. September 20, 2	2016-09-20
Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device Grant 9,417,528 - Shirakawa , et al. August 16, 2	2016-08-16
Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device Grant 9,411,230 - Takizawa , et al. August 9, 2	2016-08-09
Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition Grant 9,291,892 - Shibuya , et al. March 22, 2	2016-03-22
Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device Grant 9,250,532 - Kato , et al. February 2, 2	2016-02-02
Pattern Forming Method, Composition Kit And Resist Film, And Method For Producing Electronic Device Using Them, And Electronic Device App 20160018734 - TAKIZAWA; HIROO ; et al.	2016-01-21
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film Grant 9,223,219 - Enomoto , et al. December 29, 2	2015-12-29
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film And Pattern Forming Method App 20150355541 - IWATO; Kaoru	2015-12-10
Pattern Forming Method, Method For Manufacturing Electronic Device Using Same, And Electronic Device App 20150338743 - IWATO; Kaoru	2015-11-26
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Method For Manufacturing Electronic Device, And Electronic Device App 20150301451 - IWATO; Kaoru	2015-10-22
Method Of Forming Pattern And Developer For Use In The Method App 20150293454 - ENOMOTO; Yuichiro ; et al.	2015-10-15
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition Grant 9,152,048 - Saegusa , et al. October 6, 2	2015-10-06
Pattern Forming Method, Resist Pattern Formed By The Method, Method For Manufacturing Electronic Device Using The Same, And Electronic Device App 20150253673 - IWATO; Kaoru ; et al.	2015-09-10
Pattern Forming Method, Multi-layered Resist Pattern, Multi-layered Film For Organic Solvent Development, Resist Composition, Method For Manufacturing Electronic Device, And Electronic Device App 20150248056 - SHIRAKAWA; Michihiro ; et al.	2015-09-03
Method of forming pattern and developer for use in the method Grant 9,097,973 - Enomoto , et al. August 4, 2	2015-08-04
Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device Grant 9,075,310 - Shirakawa , et al. July 7, 2	2015-07-07
Resin Composition And Pattern Forming Method Using The Same App 20150118623 - TSURUTA; Takuya ; et al.	2015-04-30
Method Of Forming Pattern And Actinic-ray- Or Radiation-sensitive Resin Composition For Use In The Method App 20150118621 - FUKUHARA; Toshiaki ; et al.	2015-04-30
Resist composition and method of forming pattern therewith Grant 9,017,917 - Iwato , et al. April 28, 2	2015-04-28
Pattern forming method, chemical amplification resist composition and resist film Grant 8,999,621 - Enomoto , et al. April 7, 2	2015-04-07
Pattern forming method, chemical amplification resist composition and resist film Grant 8,999,622 - Iwato , et al. April 7, 2	2015-04-07
Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same Grant 8,993,211 - Iwato March 31, 2	2015-03-31
Pattern forming method, chemical amplification resist composition and resist film Grant 8,956,802 - Iwato February 17, 2	2015-02-17
Negative pattern forming method and resist pattern Grant 8,859,192 - Kato , et al. October 14, 2	2014-10-14
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And, Resist Film, Pattern Forming Method, Electronic Device Manufacturing Method, And Electronic Device, Each Using The Composition App 20140287363 - SHIBUYA; Akinori ; et al.	2014-09-25
Actinic Ray- Or Radiation-sensitive Resin Composition, Actinic Ray- Or Radiation-sensitive Film And Method Of Forming Pattern App 20140248562 - SHIBUYA; Akinori ; et al.	2014-09-04
Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device Grant 8,822,129 - Iwato , et al. September 2, 2	2014-09-02
Actinic Ray- Or Radiation-sensitive Resin Composition, Actinic Ray- Or Radiation-sensitive Film And Method Of Forming Pattern App 20140234759 - KATAOKA; Shohei ; et al.	2014-08-21
Pattern Forming Method, Multi-layered Resist Pattern, Multi-layered Film For Organic Solvent Development, Resist Composition, Method For Manufacturing Electronic Device, And Electronic Device App 20140234761 - SHIRAKAWA; Michihiro ; et al.	2014-08-21
Pattern forming method, pattern, chemical amplification resist composition and resist film Grant 8,808,965 - Iwato , et al. August 19, 2	2014-08-19
Pattern Forming Method, Multi-layered Resist Pattern, Multi-layered Film For Organic Solvent Development, Manufacturing Method Of Electronic Device, And Electronic Device App 20140227637 - KATO; Keita ; et al.	2014-08-14
Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition Grant 8,802,349 - Yoshidome , et al. August 12, 2	2014-08-12
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition Grant 8,795,944 - Saegusa , et al. August 5, 2	2014-08-05
Pattern Forming Method, Electron Beam-sensitive Or Extreme Ultraviolet-sensitive Composition, Resist Film, Method For Manufacturing Electronic Device Using The Same, And Electronic Device App 20140212796 - TAKIZAWA; Hiroo ; et al.	2014-07-31
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film Therefrom, Method Of Forming Pattern Using The Composition, Process For Manufacturing Electronic Device And Electronic Device App 20140212814 - ITO; Junichi ; et al.	2014-07-31
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20140205947 - IWATO; Kaoru ; et al.	2014-07-24
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Grant 8,771,916 - Hirano , et al. July 8, 2	2014-07-08
Pattern forming method, chemical amplification resist composition and resist film Grant 8,753,802 - Kato , et al. June 17, 2	2014-06-17
Pattern forming method, chemical amplification resist composition and resist film Grant 8,722,319 - Iwato , et al. May 13, 2	2014-05-13
Method Of Forming Pattern App 20140127629 - KATO; Keita ; et al.	2014-05-08
Pattern Forming Method, Multi-layered Resist Pattern, Multi-layered Film For Organic Solvent Development, Resist Composition, Method For Manufacturing Electronic Device, And Electronic Device App 20140113223 - KATO; Keita ; et al.	2014-04-24
Method of forming pattern Grant 8,663,907 - Kato , et al. March 4, 2	2014-03-04
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition Grant 8,632,938 - Sugiyama , et al. January 21, 2	2014-01-21
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Grant 8,617,788 - Kato , et al. December 31, 2	2013-12-31
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same Grant 08617788 -	2013-12-31
Negative Pattern Forming Method And Resist Pattern App 20130266777 - KATO; Keita ; et al.	2013-10-10
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20130202999 - IWATO; Kaoru	2013-08-08
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And Resist Film, Pattern Forming Method, Electronic Device Manufacturing Method, And Electronic Device, Each Using The Composition App 20130136900 - SHIBUYA; Akinori ; et al.	2013-05-30
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Resist Film App 20130122427 - KATAOKA; Shohei ; et al.	2013-05-16
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20130115556 - IWATO; Kaoru ; et al.	2013-05-09
Pattern Forming Method, Electron Beam-sensitive Or Extreme Ultraviolet-sensitive Composition, Resist Film, Manufacturing Method Of Electronic Device, And Electronic Device App 20130084438 - IWATO; Kaoru ; et al.	2013-04-04
Actinic-ray-sensitive Or Radiation-sensitive Resin Composition, And Resist Film Using The Same, Pattern Forming Method, Electronic Device Manufacturing Method, And Electronic Device, Each Using The Same App 20130078433 - IWATO; Kaoru ; et al.	2013-03-28
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20130045365 - KATO; Keita ; et al.	2013-02-21
Pattern Forming Method And Actinic-ray- Or Radiation-senstive Resin Composition App 20130040096 - Iwato; Kaoru ; et al.	2013-02-14
Polymerizable compound and polymer compound obtained by using the same Grant 8,362,170 - Hirano , et al. January 29, 2	2013-01-29
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And Actinic Ray-sensitive Or Radiation-sensitive Film And Pattern Forming Method Using The Same App 20130020684 - IWATO; Kaoru	2013-01-24
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Same App 20130017377 - Kataoka; Shohei ; et al.	2013-01-17
Pattern Forming Method And Resist Composition App 20130011785 - Kato; Keita ; et al.	2013-01-10
Pattern Forming Method And Resist Composition App 20120321855 - Iwato; Kaoru ; et al.	2012-12-20
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20120322007 - Kato; Keita ; et al.	2012-12-20
Pattern Forming Method, Pattern, Chemical Amplification Resist Composition And Resist Film App 20120288691 - Iwato; Kaoru ; et al.	2012-11-15
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Resist Film App 20120282548 - Enomoto; Yuichiro ; et al.	2012-11-08
Polymerizable Compound And Polymer Compound Obtained By Using The Same App 20120271021 - HIRANO; Shuji ; et al.	2012-10-25
Polymerizable compound and polymer compound obtained by using the same Grant 8,252,877 - Hirano , et al. August 28, 2	2012-08-28
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20120148957 - Enomoto; Yuichiro ; et al.	2012-06-14
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition Grant 8,158,326 - Kodama , et al. April 17, 2	2012-04-17
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20120077122 - IWATO; Kaoru ; et al.	2012-03-29
Method Of Forming Pattern App 20120052449 - KATO; Keita ; et al.	2012-03-01
Method Of Forming Pattern And Organic Processing Liquid For Use In The Method App 20120028196 - KAMIMURA; Sou ; et al.	2012-02-02
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Resist Film And Pattern Forming Method Using The Composition App 20120015301 - Yoshidome; Masahiro ; et al.	2012-01-19
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Pattern Forming Method Using The Same App 20120009522 - Kato; Takayuki ; et al.	2012-01-12
Method Of Forming Pattern And Developer For Use In The Method App 20120003591 - ENOMOTO; Yuichiro ; et al.	2012-01-05
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Pattern Forming Method Using The Composition App 20110318687 - Saegusa; Hiroshi ; et al.	2011-12-29
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Pattern Forming Method Using The Same App 20110236828 - Hirano; Shuji ; et al.	2011-09-29
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition App 20110091809 - Saegusa; Hiroshi ; et al.	2011-04-21
Positive resist composition and pattern forming method using the same Grant 7,887,988 - Mizutani , et al. February 15, 2	2011-02-15
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition App 20100248136 - SUGIYAMA; Shinichi ; et al.	2010-09-30
Polymerizable Compound And Polymer Compound Obtained By Using The Same App 20100152401 - HIRANO; Shuji ; et al.	2010-06-17
Polymerizable Compound, Lactone-containing Compound, Method For Manufacturing Lactone-containing Compound And Polymer Compound Obtained By Polymerizing The Polymerizable Compound App 20100152400 - IIZUKA; Yusuke ; et al.	2010-06-17
Positive photosensitive composition and a pattern-forming method using the same Grant 7,700,261 - Kodama , et al. April 20, 2	2010-04-20
Positive resist composition and pattern formation method using the positive resist composition Grant 7,687,219 - Iwato , et al. March 30, 2	2010-03-30
Resist Composition And Method Of Forming Pattern Therewith App 20100028804 - IWATO; Kaoru ; et al.	2010-02-04
Positive resist composition and pattern formation method using the positive resist composition Grant 7,632,623 - Iwato , et al. December 15, 2	2009-12-15
Positive resist composition and pattern forming method using the same Grant 7,625,690 - Mizutani , et al. December 1, 2	2009-12-01
Film Forming Composition, Insulating Film, And Electronic Device App 20090221779 - Kubo; Youhei ; et al.	2009-09-03
Positive Photosensitive Composition And A Pattern-forming Method Using The Same App 20090081581 - Kodama; Kunihiko ; et al.	2009-03-26
Photosensitive Composition, Compound For Use In The Photosensitive Composition, And Method Of Pattern Formation With The Photosensitive Composition App 20090075202 - KODAMA; Kunihiko ; et al.	2009-03-19
Film Forming Composition, Film, And Electronic Device App 20090048421 - Kubo; Youhei ; et al.	2009-02-19
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition Grant 7,449,573 - Kodama , et al. November 11, 2	2008-11-11
Positive resist composition and pattern formation method using the positive resist composition Grant 7,442,490 - Iwato , et al. October 28, 2	2008-10-28
Composition For Forming Low-dielectric-constant Film, Insulating Film, And Electronic Device App 20080161532 - IWATO; Kaoru	2008-07-03
Positive resist composition and pattern formation method using the positive resist composition App 20080044760 - Iwato; Kaoru ; et al.	2008-02-21
Positive resist composition and pattern forming method using the same App 20070218407 - Mizutani; Kazuyoshi ; et al.	2007-09-20
Positive resist composition and pattern formation method using the positive resist composition App 20070218405 - Iwato; Kaoru ; et al.	2007-09-20
Image Forming Material App 20070122738 - IWATO; Kaoru	2007-05-31
Positive resist composition and pattern formation method using the positive resist composition App 20070105045 - Iwato; Kaoru ; et al.	2007-05-10
Image forming material Grant 7,160,667 - Iwato January 9, 2	2007-01-09
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition App 20060040203 - Kodama; Kunihiko ; et al.	2006-02-23
Image forming material and ammonium compound Grant 6,958,205 - Iwato , et al. October 25, 2	2005-10-25
Planographic printing plate precursor Grant 6,841,330 - Miyake , et al. January 11, 2	2005-01-11
Image forming material App 20040152012 - Iwato, Kaoru	2004-08-05
Planographic printing plate precursor App 20040146800 - Watanabe, Kotaro ; et al.	2004-07-29
Image forming material App 20040067435 - Iwato, Kaoru ; et al.	2004-04-08
Image forming material and ammonium compound App 20030143481 - Iwato, Kaoru ; et al.	2003-07-31
Planographic printing plate precursor App 20020136979 - Miyake, Hideo ; et al.	2002-09-26