Iwao; Fumiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Iwao; Fumiko.The latest application filed is for "film forming method, computer storage medium, and film forming system".

Company Profile

0.13.10

Iwao; Fumiko - Tokyo JP
Iwao; Fumiko - Nirasaki JP
IWAO; Fumiko - Minato-ku Tokyo
IWAO; Fumiko - Nirasaki City JP
Iwao; Fumiko - Koshi-Machi JP
Iwao; Fumiko - Narashino JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Film forming method, computer storage medium, and film forming system Grant 9,741,559 - Shimura , et al. August 22, 2	2017-08-22
Substrate treatment method, non-transitory computer storage medium and substrate treatment system Grant 9,341,952 - Iwao , et al. May 17, 2	2016-05-17
Film forming method, non-transitory computer storage medium and film forming apparatus Grant 9,329,483 - Iwao , et al. May 3, 2	2016-05-03
Substrate treatment method, non-transitory computer storage medium and substrate treatment system Grant 9,280,052 - Iwao , et al. March 8, 2	2016-03-08
Film Forming Method, Computer Storage Medium, And Film Forming System App 20150357188 - SHIMURA; Satoru ; et al.	2015-12-10
Substrate treatment method, substrate treatment apparatus, and non-transitory computer storage medium Grant 8,842,257 - Kobayashi , et al. September 23, 2	2014-09-23
Substrate Treatment Method, Non-transitory Computer Storage Medium And Substrate Treatment System App 20140255852 - IWAO; Fumiko ; et al.	2014-09-11
Substrate Treatment Method, Non-transitory Computer Storage Medium And Substrate Treatment System App 20140255844 - IWAO; Fumiko ; et al.	2014-09-11
Coating treatment method and coating treatment apparatus Grant 8,791,030 - Iwao , et al. July 29, 2	2014-07-29
Film Forming Method, Non-transitory Computer Storage Medium And Film Forming Apparatus App 20140170332 - IWAO; Fumiko ; et al.	2014-06-19
Coating Treatment Method And Coating Treatment Apparatus App 20140038423 - IWAO; Fumiko ; et al.	2014-02-06
Method for manufacturing semiconductor device and apparatus for manufacturing semiconductor device Grant 8,530,357 - Iwao September 10, 2	2013-09-10
Method For Manufacturing Semiconductor Device And Apparatus For Manufacturing Semiconductor Device App 20120302066 - Iwao; Fumiko	2012-11-29
Substrate Treatment Method, Substrate Treatment Apparatus, And Non-transitory Computer Storage Medium App 20120225390 - KOBAYASHI; Shinji ; et al.	2012-09-06
Method of manufacturing semiconductor device, and resist coating and developing system Grant 8,202,682 - Iwao , et al. June 19, 2	2012-06-19
Substrate cleaning method and developing apparatus Grant 7,901,514 - Nakamura , et al. March 8, 2	2011-03-08
Substrate Cleaning Method And Developing Apparatus App 20090272407 - NAKAMURA; Junji ; et al.	2009-11-05
Substrate cleaning method and developing apparatus Grant 7,604,013 - Nakamura , et al. October 20, 2	2009-10-20
Method Of Manufacturing Semiconductor Device, And Resist Coating And Developing System App 20090220892 - IWAO; Fumiko ; et al.	2009-09-03
Substrate cleaning method and developing apparatus App 20060048792 - Nakamura; Junji ; et al.	2006-03-09
Electrochemical treating method such as electroplating and electrochemical reaction device therefor Grant 6,793,793 - Yoshida , et al. September 21, 2	2004-09-21

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