IWAKATA; Masahide
Patent Applications and Registrations
Patent applications and USPTO patent grants for IWAKATA; Masahide.The latest application filed is for "ultrasonic transducer element, ultrasonic probe, and electrode structure of ultrasonic transducer element".
- IWAKATA; Masahide - Ota-ku JP
- Iwakata; Masahide - Kawasaki N/A JP
- Iwakata; Masahide - Tokyo JP
- Iwakata; Masahide - Kawasaki-shi JP
- Iwakata, Masahide - Taito-ku JP
| Patent | Date |
|---|---|
| Ultrasonic Transducer Element, Ultrasonic Probe, And Electrode Structure Of Ultrasonic Transducer Element App 20220000453 - IWAKATA; Masahide ; et al. | 2022-01-06 |
| Optical element and method of producing same Grant 8,585,220 - Iwakata , et al. November 19, 2 | 2013-11-19 |
| Method for producing optical element and the optical element Grant 8,305,686 - Arai , et al. November 6, 2 | 2012-11-06 |
| Photomask blank and photomask Grant 8,007,964 - Yoshikawa , et al. August 30, 2 | 2011-08-30 |
| Optical Element And Method Of Producing Same App 20110032613 - Iwakata; Masahide ; et al. | 2011-02-10 |
| Photomask blank, photomask and fabrication method thereof Grant 7,771,893 - Yoshikawa , et al. August 10, 2 | 2010-08-10 |
| Photomask Blank And Photomask App 20100143831 - Yoshikawa; Hiroki ; et al. | 2010-06-10 |
| Photomask blank and photomask Grant 7,691,546 - Yoshikawa , et al. April 6, 2 | 2010-04-06 |
| Method For Producing Optical Element And The Optical Element App 20100020397 - Arai; Kazuhiro ; et al. | 2010-01-28 |
| Photomask blank, photomask and fabrication method thereof Grant 7,625,676 - Yoshikawa , et al. December 1, 2 | 2009-12-01 |
| Photomask blank, photomask and method for producing those Grant 7,618,753 - Yoshikawa , et al. November 17, 2 | 2009-11-17 |
| Film-depositing target and preparation of phase shift mask blank Grant 7,598,004 - Yoshikawa , et al. October 6, 2 | 2009-10-06 |
| Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method Grant 7,556,892 - Okada , et al. July 7, 2 | 2009-07-07 |
| Film-depositing Target And Preparation Of Phase Shift Mask Blank App 20090057143 - YOSHIKAWA; Hiroki ; et al. | 2009-03-05 |
| Photomask Blank and Photomask App 20080063950 - Yoshikawa; Hiroki ; et al. | 2008-03-13 |
| Photomask Blank, Photomask and Method for Producing Those App 20070259276 - Yoshikawa; Hiroki ; et al. | 2007-11-08 |
| Photomask blank, photomask and fabrication method thereof App 20070020534 - Yoshikawa; Hiroki ; et al. | 2007-01-25 |
| Photomask blank, photomask and fabrication method thereof App 20060088774 - Yoshikawa; Hiroki ; et al. | 2006-04-27 |
| Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method App 20050244722 - Okada, Kimihiro ; et al. | 2005-11-03 |
| Film-depositing target and preparation of phase shift mask blank App 20050217988 - Yoshikawa, Hiroki ; et al. | 2005-10-06 |
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