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Silica Glass For Radio-frequency Device And Radio-frequency Device Technical Field
App 20200255324 - Kind Code | 2020-08-13 |
Blank For Nanoimprint Mold, Nanoimprint Mold, And Methods For Producing Said Blank And Said Nanoimprint Mold
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Method for producing TiO.sub.2-SiO.sub.2 glass body, method for heat-treating TiO.sub.2-SiO.sub.2 glass body, TiO.sub.2-SiO.sub.2 glass body, and optical base for EUVL
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Method For Producing Tio2-sio2 Glass Body, Method For Heat-treating Tio2-sio2 Glass Body, Tio2-sio2 Glass Body, And Optical Base For Euvl
App 20130276480 - KOIKE; Akio ; et al. | 2013-10-24 |
Process for producing porous quartz glass object, and optical member for EUV lithography
Grant 8,356,494 - Mitsumori , et al. January 22, 2 | 2013-01-22 |
Silica glass containing TiO.sub.2 and process for its production
Grant 8,329,604 - Iwahashi , et al. December 11, 2 | 2012-12-11 |
Tio2-containing Silica Glass, And Optical Member For Euv Lithography
App 20120149543 - KOIKE; Akio ; et al. | 2012-06-14 |
Method For Producing Tio2-sio2 Glass Body, Method For Heat-treating Tio2-sio2 Glass Body, Tio2-sio2 Glass Body, And Optical Base For Euvl
App 20120121857 - Koike; Akio ; et al. | 2012-05-17 |
TiO.sub.2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture
Grant 8,178,450 - Koike , et al. May 15, 2 | 2012-05-15 |
Method For Producing Tio2-sio2 Glass Body, Method For Heat-treating Tio2-sio2 Glass Body, Tio2-sio2 Glass Body, And Optical Base For Euvl
App 20120100341 - KOIKE; Akio ; et al. | 2012-04-26 |
TiO.sub.2-containing silica glass and optical member for EUV lithography using the same
Grant 8,093,165 - Koike , et al. January 10, 2 | 2012-01-10 |
Process For Producing Porous Quartz Glass Object, And Optical Member For Euv Lithography
App 20110301015 - MITSUMORI; Takahiro ; et al. | 2011-12-08 |
TIO.sub.2-containing silica glass and optical member for lithography using the same
Grant 8,034,731 - Koike , et al. October 11, 2 | 2011-10-11 |
TiO.sub.2-containing silica glass and optical member for lithography using the same
Grant 7,998,892 - Koike , et al. August 16, 2 | 2011-08-16 |
TiO.sub.2-containing silica glass
Grant 7,989,378 - Koike , et al. August 2, 2 | 2011-08-02 |
Tio2-containing Quartz Glass Substrate
App 20110089612 - IKUTA; YOSHIAKI ; et al. | 2011-04-21 |
Tio2-containing Silica Glass And Optical Member For Lithography Using The Same
App 20100323873 - Koike; Akio ; et al. | 2010-12-23 |
Tio2-containing Silica Glass And Optical Member For Euv Lithography Using High Energy Densities As Well As Special Temperature Controlled Process For Its Manufacture
App 20100323871 - Koike; Akio ; et al. | 2010-12-23 |
Tio2-containing Silica Glass And Optical Member For Euv Lithography Using The Same
App 20100323872 - KOIKE; Akio ; et al. | 2010-12-23 |
Tio2-containing Silica Glass And Optical Member For Lithography Using The Same
App 20100317505 - KOIKE; Akio ; et al. | 2010-12-16 |
Tio2-containing Silica Glass
App 20100261597 - KOIKE; Akio ; et al. | 2010-10-14 |
TiO2-containing quartz glass substrate
App 20100234205 - Ikuta; Yoshiaki ; et al. | 2010-09-16 |
Process For Producing Silica Glass Containing Tio2, And Optical Material For Euv Lithography Employing Silica Glass Containing Tio2
App 20090242387 - KOIKE; Akio ; et al. | 2009-10-01 |
Silica glass containing TiO.sub.2 and process for its production
Grant 7,538,052 - Iwahashi , et al. May 26, 2 | 2009-05-26 |
Silica Glass Containing Tio2 And Process For Its Production
App 20090122281 - IWAHASHI; Yasutomi ; et al. | 2009-05-14 |
Silica glass containing TiO.sub.2 and optical material for EUV lithography
Grant 7,462,574 - Iwahashi , et al. December 9, 2 | 2008-12-09 |
Silica glass containing TiO.sub.2 and process for its production
Grant 7,429,546 - Iwahashi , et al. September 30, 2 | 2008-09-30 |
Silica glass containing TiO.sub.2 and process for its production
Grant 7,419,924 - Koike , et al. September 2, 2 | 2008-09-02 |
Silica glass containing TiO.sub.2 and process for its production
Grant 7,410,922 - Iwahashi , et al. August 12, 2 | 2008-08-12 |
SILICA GLASS CONTAINING TiO2 AND PROCESS FOR ITS PRODUCTION
App 20080103037 - IWAHASHI; Yasutomi ; et al. | 2008-05-01 |
Silica glass
Grant 7,294,595 - Iwahashi , et al. November 13, 2 | 2007-11-13 |
Process For Producing Silica Glass Containing Tio2, And Optical Material For Euv Lithography Employing Silica Glass Containing Tio2
App 20070207911 - KOIKE; Akio ; et al. | 2007-09-06 |
Silica glass containing TiO2 and process for its production
App 20070042893 - Koike; Akio ; et al. | 2007-02-22 |
Silica glass
App 20060276323 - Iwahashi; Yasutomi ; et al. | 2006-12-07 |
Silica glass containing TiO2 and process for its production
App 20050272590 - Iwahashi, Yasutomi ; et al. | 2005-12-08 |
Silica glass containing TiO2 and optical material for EUV lithography
App 20050245383 - Iwahashi, Yasutomi ; et al. | 2005-11-03 |
Silica glass containing TiO2 and process for its production
App 20050245382 - Iwahashi, Yasutomi ; et al. | 2005-11-03 |
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