Iwade; Kenji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Iwade; Kenji.The latest application filed is for "template cleaning method, template cleaning apparatus, and cleaning liquid".

Company Profile

0.12.13

Iwade; Kenji - Mie JP
Iwade; Kenji - Hiratsuka JP
Iwade; Kenji - Yokkaichi JP
Iwade; Kenji - Tokyo JP
Iwade; Kenji - Hiratsuka-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Manufacturing method of semiconductor device Grant 10,121,677 - Matsui , et al. November 6, 2	2018-11-06
Template Cleaning Method, Template Cleaning Apparatus, And Cleaning Liquid App 20180264524 - TANAKA; Yumi ; et al.	2018-09-20
Manufacturing Method Of Semiconductor Device And Slurry For Chemical Mechanical Polishing App 20170133238 - KAWASAKI; Takahiko ; et al.	2017-05-11
Manufacturing method of semiconductor device Grant 9,558,961 - Gawase , et al. January 31, 2	2017-01-31
Manufacturing Method Of Semiconductor Device App 20160358787 - GAWASE; Akifumi ; et al.	2016-12-08
Manufacturing Method Of Semiconductor Device App 20160322231 - Matsui; Yukiteru ; et al.	2016-11-03
Retainer Ring, Polishing Apparatus, And Manufacturing Method Of Semiconductor Device App 20160229026 - KAWASAKI; Takahiko ; et al.	2016-08-11
Method for manufacturing semiconductor device Grant 8,748,289 - Nakanishi , et al. June 10, 2	2014-06-10
Polishing apparatus and polishing method Grant 8,641,480 - Nakanishi , et al. February 4, 2	2014-02-04
Method For Manufacturing Semiconductor Device App 20130237033 - NAKANISHI; Masayuki ; et al.	2013-09-12
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method Grant 8,492,276 - Abe , et al. July 23, 2	2013-07-23
Method for manufacturing semiconductor device Grant 8,445,360 - Nakanishi , et al. May 21, 2	2013-05-21
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method Grant 8,292,694 - Togawa , et al. October 23, 2	2012-10-23
Polishing Method App 20110256811 - NAKANISHI; Masayuki ; et al.	2011-10-20
Polishing Apparatus And Polishing Method App 20110217906 - NAKANISHI; Masayuki ; et al.	2011-09-08
Method For Manufacturing Semiconductor Device App 20110207294 - NAKANISHI; Masayuki ; et al.	2011-08-25
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method Grant 7,883,394 - Togawa , et al. February 8, 2	2011-02-08
Chemical Mechanical Polishing Aqueous Dispersion And Chemical Mechanical Polishing Method App 20100075501 - ABE; Taichi ; et al.	2010-03-25
Substrate Holding Mechanism, Substrate Polishing Apparatus And Substrate Polishing Method App 20100062691 - TOGAWA; Tetsuji ; et al.	2010-03-11
Substrate Holding Mechanism, Substrate Polishing Apparatus And Substrate Polishing Method App 20080318503 - TOGAWA; Tetsuji ; et al.	2008-12-25
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method Grant 7,419,420 - Togawa , et al. September 2, 2	2008-09-02
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method App 20060205323 - Togawa; Tetsuji ; et al.	2006-09-14

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