Iwabuchi; Katsuhiko
Patent Applications and Registrations
Patent applications and USPTO patent grants for Iwabuchi; Katsuhiko.The latest application filed is for "plasma electrode and plasma processing device".
- Iwabuchi; Katsuhiko - Nirasaki JP
- IWABUCHI; Katsuhiko - Nirasaki City Yamanashi
- Iwabuchi; Katsuhiko - Kanagawa JP
- Iwabuchi; Katsuhiko - Tsukui-gun JP
- Iwabuchi; Katsuhiko - Tsuki-gun JP
- Iwabuchi; Katsuhiko - Kanagawa Ken JP
- Iwabuchi; Katsuhiko - Sagamihara JP
| Patent | Date |
|---|---|
| Plasma electrode and plasma processing device Grant 10,600,621 - Morishima , et al. | 2020-03-24 |
| Plasma Electrode And Plasma Processing Device App 20190108984 - MORISHIMA; Masato ; et al. | 2019-04-11 |
| Substrate processing method Grant 8,574,676 - Yasui , et al. November 5, 2 | 2013-11-05 |
| Load lock apparatus, processing system and substrate processing method Grant 8,196,619 - Iwabuchi June 12, 2 | 2012-06-12 |
| Substrate Processing Apparatus App 20110247560 - Yasui; Kanji ; et al. | 2011-10-13 |
| Substrate Processing Method And Substrate Processing Apparatus App 20110229637 - Yasui; Kanji ; et al. | 2011-09-22 |
| Electrostatic chuck for substrate stage, electrode used for the chuck, and treating system having the chuck and electrode Grant 7,916,447 - Kobayashi , et al. March 29, 2 | 2011-03-29 |
| Substrate processing device Grant 7,780,391 - Matsuoka , et al. August 24, 2 | 2010-08-24 |
| Load Lock Apparatus, Processing System And Substrate Processing Method App 20100040437 - IWABUCHI; Katsuhiko | 2010-02-18 |
| Load lock apparatus, processing system and substrate processing method Grant 7,624,772 - Iwabuchi December 1, 2 | 2009-12-01 |
| Load lock apparatus, load lock section, substrate processing system and substrate processing method App 20060245852 - Iwabuchi; Katsuhiko | 2006-11-02 |
| Load lock apparatus, processing system and substrate processing method App 20060231027 - Iwabuchi; Katsuhiko | 2006-10-19 |
| Electrostatic chuck for substrate stage, electrode used for the chuck, and treating system having the chuck and electrode App 20060164786 - Kobayashi; Toshiki ; et al. | 2006-07-27 |
| Treating apparatus App 20060112880 - Iwabuchi; Katsuhiko ; et al. | 2006-06-01 |
| Substrate processing device App 20050238464 - Matsuoka, Takaaki ; et al. | 2005-10-27 |
| Plasma processing equipment and plasma processing method App 20040168769 - Matsuoka, Takaaki ; et al. | 2004-09-02 |
| Plasma processing apparatus Grant 6,432,208 - Kawakami , et al. August 13, 2 | 2002-08-13 |
| Vacuum processing method Grant 6,022,418 - Iwabuchi February 8, 2 | 2000-02-08 |
| Wafer processing apparatus Grant 5,697,749 - Iwabuchi , et al. December 16, 1 | 1997-12-16 |
| Processing apparatus Grant 5,462,397 - Iwabuchi October 31, 1 | 1995-10-31 |
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