ITSUKI; Atsushi

Patent Applications and Registrations

Patent applications and USPTO patent grants for ITSUKI; Atsushi.The latest application filed is for "vaporizable source material container and solid vaporization/supply system using the same".

Company Profile

0.3.9

ITSUKI; Atsushi - Sakado-shi Saitama
Itsuki; Atsushi - Iwaki-shi JP
Itsuki; Atsushi - Naka-gun JP
Itsuki; Atsushi - Ibaraki JP
Itsuki, Atsushi - Saitama JP
Itsuki; Atsushi - Omiya JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Vaporizable Source Material Container And Solid Vaporization/supply System Using The Same App 20220090261 - ITSUKI; Atsushi ; et al.	2022-03-24
Solid Vaporization/supply System Of Metal Halide For Thin Film Deposition App 20220064786 - ITSUKI; Atsushi ; et al.	2022-03-03
Raw Material Solution for Metal Organic Chemical Vapor Deposition Method and Method for Manufacturing Composite Oxide Film Containing Hf-Si Using the Raw Material Solution App 20080299312 - Itsuki; Atsushi ; et al.	2008-12-04
Raw Material Solution for Metal Organic Chemical Vapor Deposition and Composite Oxide-Based Dielectric Thin Film Produced by Using the Raw Material App 20080072792 - Yanagisawa; Akio ; et al.	2008-03-27
Capacitor Film Forming Material App 20070231251 - Itsuki; Atsushi ; et al.	2007-10-04
Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same Grant 7,196,211 - Itsuki , et al. March 27, 2	2007-03-27
Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same Grant 7,148,367 - Itsuki December 12, 2	2006-12-12
Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same App 20050065358 - Itsuki, Atsushi ; et al.	2005-03-24
Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same App 20040210071 - Itsuki, Atsushi	2004-10-21
Method of forming Si-containing thin film App 20040203255 - Itsuki, Atsushi	2004-10-14
Novel organic titanium compound suitable for MOCVD App 20010050028 - Itsuki, Atsushi ; et al.	2001-12-13
Composition for formation of electrode pattern Grant 5,696,384 - Ogi , et al. December 9, 1	1997-12-09

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