Itoga; Kenji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Itoga; Kenji.The latest application filed is for "area light source device and display device using same".

Company Profile

0.11.10

Itoga; Kenji - Tokyo JP
Itoga; Kenji - Hyogo JP
Itoga; Kenji - Chiyoda-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Area light source device and display device using same Grant 9,500,795 - Itoga , et al. November 22, 2	2016-11-22
Area Light Source Device And Display Device Using Same App 20150192724 - Itoga; Kenji ; et al.	2015-07-09
Illumination device and liquid crystal display having a light guide plate with protrusions of multiple heights Grant 8,885,118 - Yuuki , et al. November 11, 2	2014-11-11
Planar light source device and method of manufacturing divided prism mold Grant 8,348,490 - Yuuki , et al. January 8, 2	2013-01-08
Illumination Device And Liquid Crystal Display App 20120127400 - YUUKI; Akimasa ; et al.	2012-05-24
Flat Surface Light Source Device And Method For Manufacturing Metallic Mold For Dividing Prism App 20110002142 - Yuuki; Akimasa ; et al.	2011-01-06
Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask Grant 7,197,108 - Watanabe , et al. March 27, 2	2007-03-27
X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure Grant 6,947,519 - Itoga , et al. September 20, 2	2005-09-20
X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device Grant 6,947,518 - Itoga , et al. September 20, 2	2005-09-20
X-ray exposure method and semiconductor device manufactured using this X-ray exposure method as well as X-ray mask, X-ray exposure unit and resist material Grant 6,901,133 - Watanabe , et al. May 31, 2	2005-05-31
Method of fabricating X-ray mask and method of fabricating semiconductor device with X-ray mask fabricated by this method App 20050074676 - Watanabe, Hiroshi ; et al.	2005-04-07
Dust particle inspection method for X-ray mask Grant 6,770,408 - Ina , et al. August 3, 2	2004-08-03
X-ray exposure method, x-ray exposure apparatus, fine structure and semiconductor device Grant 6,735,275 - Itoga , et al. May 11, 2	2004-05-11
X-ray exposure method and semiconductor device manufactured using this X-ray exposure method as well as X-ray mask, X-ray exposure unit and resist material App 20030174805 - Watanabe, Hiroshi ; et al.	2003-09-18
X-ray exposure method, x-ray exposure apparatus, fine structure and semiconductor device App 20030099324 - Itoga, Kenji ; et al.	2003-05-29
Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure App 20020196896 - Kitayama, Toyoki ; et al.	2002-12-26
X-ray mask and device manufacturing method using the same App 20020197545 - Ina, Hideki ; et al.	2002-12-26
X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure App 20020048341 - Itoga, Kenji ; et al.	2002-04-25
X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device App 20010021239 - Itoga, Kenji ; et al.	2001-09-13
Levitator with rotation control Grant 5,155,651 - Yoda , et al. October 13, 1	1992-10-13

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