Ito; Kiyohito
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ito; Kiyohito.The latest application filed is for "treatment method".
- Ito; Kiyohito - Miyagi JP
- Ito; Kiyohito - Kurokawa-gun JP
- Ito; Kiyohito - Delmar NY
- Ito; Kiyohito - Fishkill NY
- ITO; Kiyohito - Hopewell Junction NY
- Ito; Kiyohito - Nirasaki JP
- Ito; Kiyohito - Nirasaki City JP
- Ito, Kiyohito - Nirasaki-shi JP
| Patent | Date |
|---|---|
| Processing method and substrate processing apparatus Grant 11,380,545 - Yoshimura , et al. July 5, 2 | 2022-07-05 |
| Treatment Method App 20210313187 - ITO; Kiyohito ; et al. | 2021-10-07 |
| Etching method Grant 10,950,458 - Hama , et al. March 16, 2 | 2021-03-16 |
| Substrate processing method and substrate processing apparatus Grant 10,886,138 - Yang , et al. January 5, 2 | 2021-01-05 |
| Processing Method And Substrate Processing Apparatus App 20200144051 - YOSHIMURA; Shota ; et al. | 2020-05-07 |
| Substrate Processing Method And Substrate Processing Apparatus App 20190355588 - Yang; Timothy Tianshyun ; et al. | 2019-11-21 |
| Etching Method App 20190214269 - Hama; Yasutaka ; et al. | 2019-07-11 |
| Partial etch memorization via flash addition Grant 9,576,812 - Franke , et al. February 21, 2 | 2017-02-21 |
| Partial Etch Memorization Via Flash Addition App 20160293435 - Franke; Elliott ; et al. | 2016-10-06 |
| Material processing to achieve sub-10nm patterning Grant 9,443,731 - O'Meara , et al. September 13, 2 | 2016-09-13 |
| Material Processing To Achieve Sub-10nm Patterning App 20160247680 - O'Meara; David L. ; et al. | 2016-08-25 |
| Mitigation of asymmetrical profile in self aligned patterning etch Grant 9,257,280 - Ko , et al. February 9, 2 | 2016-02-09 |
| Mitigation Of Asymmetrical Profile In Self Aligned Patterning Etch App 20140357084 - KO; Akiteru ; et al. | 2014-12-04 |
| Plasma Etching Method And Plasma Etching Apparatus App 20140284308 - MATSUYAMA; Shoichiro ; et al. | 2014-09-25 |
| Substrate processing method Grant 8,232,207 - Ogasawara , et al. July 31, 2 | 2012-07-31 |
| Substrate Processing Method App 20100167549 - OGASAWARA; Kosuke ; et al. | 2010-07-01 |
| Plasma processing method App 20040222190 - Horiguchi, Katsumi ; et al. | 2004-11-11 |
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