Ito; Keiki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ito; Keiki.The latest application filed is for "power supply system, plasma processing apparatus and power supply control method".

Company Profile

0.9.8

Ito; Keiki - Miyagi JP
Ito; Keiki - Kurokawa-gun JP
Ito; Keiki - Nirasaki JP
Ito; Keiki - Nirasaki-shi JP
Ito; Keiki - Yamanashi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing apparatus and filter unit Grant 10,074,519 - Ito , et al. September 11, 2	2018-09-11
Power supply system, plasma processing apparatus and power supply control method Grant 10,056,230 - Hirano , et al. August 21, 2	2018-08-21
Power Supply System, Plasma Processing Apparatus And Power Supply Control Method App 20160284514 - Hirano; Taichi ; et al.	2016-09-29
Gas supply unit, substrate processing apparatus and supply gas setting method Grant 9,441,791 - Mizusawa , et al. September 13, 2	2016-09-13
Plasma Processing Apparatus And Filter Unit App 20150235809 - Ito; Keiki ; et al.	2015-08-20
Gas supply unit, substrate processing apparatus and supply gas setting method Grant 8,906,193 - Mizusawa , et al. December 9, 2	2014-12-09
Gas Supply Unit, Substrate Processing Apparatus And Supply Gas Setting Method App 20130092322 - MIZUSAWA; Kenetsu ; et al.	2013-04-18
Flow rate control system and shower plate used for partial pressure control system Grant 8,109,288 - Nagaoka , et al. February 7, 2	2012-02-07
Gas Supply Unit, Substrate Processing Apparatus And Supply Gas Setting Method App 20100163112 - Mizusawa; Kenetsu ; et al.	2010-07-01
Partial pressure control system, flow rate control system and shower plate used for partial pressure control system Grant 7,481,240 - Nagaoka , et al. January 27, 2	2009-01-27
Flow rate control system and shower plate used for partial pressure control system App 20080300728 - Nagaoka; Hideki ; et al.	2008-12-04
Relative pressure control system and relative flow control system Grant 7,353,841 - Kono , et al. April 8, 2	2008-04-08
Gas supply unit, substrate processing apparatus, and supply gas setting method App 20060124169 - Mizusawa; Kenetsu ; et al.	2006-06-15
Relative pressure control system and relative flow control system App 20060097644 - Kono; Tetsujiro ; et al.	2006-05-11
Partial pressure control system, flow rate control system and shower plate used for partial pressure control system App 20050029369 - Nagaoka, Hideki ; et al.	2005-02-10
Magnetron plasma processing system Grant 5,554,249 - Hasegawa , et al. September 10, 1	1996-09-10

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