Ito; Fuyuma

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ito; Fuyuma.The latest application filed is for "semiconductor substrate, method of manufacturing semiconductor device, and method of manufacturing semiconductor substrate".

Company Profile

8.6.12

Ito; Fuyuma - Yokkaichi Mie JP
ITO; Fuyuma - Yokkaichi JP
ITO; Fuyuma - Mie JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate treatment device, substrate treatment method, and semiconductor device manufacturing method Grant 11,342,182 - Yoshimizu , et al. May 24, 2	2022-05-24
Semiconductor Substrate, Method Of Manufacturing Semiconductor Device, And Method Of Manufacturing Semiconductor Substrate App 20220085153 - ITO; Fuyuma ; et al.	2022-03-17
Plasma Treatment Apparatus, Semiconductor Manufacturing Apparatus, And Manufacturing Method Of Semiconductor Device App 20220013367 - YOSHIMIZU; Yasuhito ; et al.	2022-01-13
Semiconductor Wafer And Method Of Manufacturing Semiconductor Apparatus App 20210407867 - ITO; Fuyuma ; et al.	2021-12-30
Substrate treatment apparatus and method of manufacturing semiconductor device Grant 11,171,022 - Kitagawa , et al. November 9, 2	2021-11-09
Substrate Treatment Apparatus And Manufacturing Method Of Semiconductor Device App 20210090913 - YOSHIMIZU; Yasuhito ; et al.	2021-03-25
Substrate treatment apparatus and manufacturing method of semiconductor device Grant 10,879,087 - Yoshimizu , et al. December 29, 2	2020-12-29
Substrate treatment apparatus, method of manufacturing semiconductor device and workpiece substrate Grant 10,804,221 - Ito , et al. October 13, 2	2020-10-13
Substrate treating method and semiconductor device manufacturing method Grant 10,720,321 - Yoshimizu , et al.	2020-07-21
Substrate Treatment Device, Substrate Treatment Method, And Semiconductor Device Manufacturing Method App 20200185221 - YOSHIMIZU; Yasuhito ; et al.	2020-06-11
Substrate Treatment Apparatus, Method Of Manufacturing Semiconductor Device And Workpiece Substrate App 20200091092 - Ito; Fuyuma ; et al.	2020-03-19
Substrate Treating Method And Semiconductor Device Manufacturing Method App 20200075315 - YOSHIMIZU; Yasuhito ; et al.	2020-03-05
Substrate Treatment Apparatus And Method Of Manufacturing Semiconductor Device App 20200066550 - KITAGAWA; Hakuba ; et al.	2020-02-27
Plasma Treatment Apparatus, Semiconductor Manufacturing Apparatus, And Manufacturing Method Of Semiconductor Device App 20190035636 - Yoshimizu; Yasuhito ; et al.	2019-01-31
Substrate Treatment Apparatus And Substrate Treatment Method App 20180265989 - YOSHIMIZU; Yasuhito ; et al.	2018-09-20
Substrate Treatment Apparatus And Manufacturing Method Of Semiconductor Device App 20180269082 - Yoshimizu; Yasuhito ; et al.	2018-09-20
Semiconductor device manufacture method Grant 9,991,159 - Ito , et al. June 5, 2	2018-06-05
Semiconductor Device Manufacturing Method App 20180082893 - ITO; Fuyuma ; et al.	2018-03-22

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