loadpatents
name:-0.012471199035645
name:-0.0086920261383057
name:-0.00054287910461426
Isono; Toshihisa Patent Filings

Isono; Toshihisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Isono; Toshihisa.The latest application filed is for "plating method".

Company Profile
0.11.12
  • Isono; Toshihisa - Osaka N/A JP
  • Isono; Toshihisa - Hirakata N/A JP
  • Isono; Toshihisa - Hirakata-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plating method
Grant 9,730,337 - Isono , et al. August 8, 2
2017-08-08
Electrolytic copper plating bath and method for electroplating using the electrolytic copper plating bath
Grant 9,028,668 - Isono , et al. May 12, 2
2015-05-12
Continuous copper electroplating method
Grant 8,801,912 - Omura , et al. August 12, 2
2014-08-12
Plating Method
App 20140120245 - Isono; Toshihisa ;   et al.
2014-05-01
Copper electroplating bath
Grant 8,679,317 - Isono , et al. March 25, 2
2014-03-25
Manufacture Method Of Buildup Circuit Board
App 20130056362 - TACHIBANA; Shinji ;   et al.
2013-03-07
Continuous copper electroplating method
Grant 7,988,842 - Tachibana , et al. August 2, 2
2011-08-02
Copper Electrolytic Plating Bath And Copper Electrolytic Plating Method
App 20110089044 - Isono; Toshihisa ;   et al.
2011-04-21
Electrolytic Copper Plating Bath And Method For Electroplating Using The Electrolytic Copper Plating Bath
App 20110062029 - Isono; Toshihisa ;   et al.
2011-03-17
Electrolytic Plating Equipment And Electrolytic Plating Method
App 20110056840 - Isono; Toshihisa ;   et al.
2011-03-10
Electrolytic copper plating process
Grant 7,892,411 - Tachibana , et al. February 22, 2
2011-02-22
Copper Electroplating Bath
App 20100219081 - Isono; Toshihisa ;   et al.
2010-09-02
Continuous Copper Electroplating Method
App 20090229986 - OMURA; Naoyuki ;   et al.
2009-09-17
Manufacture Method Of Buildup Circuit Board
App 20090092749 - TACHIBANA; Shinji ;   et al.
2009-04-09
Electrolytic Copper Plating Process
App 20090038952 - TACHIBANA; Shinji ;   et al.
2009-02-12
Continuous Copper Electroplating Method
App 20090026083 - TACHIBANA; Shinji ;   et al.
2009-01-29
Electrolytic copper plating bath and plating process therewith
Grant 7,220,347 - Isono , et al. May 22, 2
2007-05-22
Electrolytic copper plating bath and plating process therewith
App 20060207886 - Isono; Toshihisa ;   et al.
2006-09-21

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