Isono; Shintaro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Isono; Shintaro.The latest application filed is for "substrate polishing method, top ring, and substrate polishing apparatus".

Company Profile

1.5.5

Isono; Shintaro - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate polishing method, top ring, and substrate polishing apparatus Grant 10,464,185 - Isono , et al. No	2019-11-05
Polishing apparatus, control method and recording medium Grant 10,391,603 - Yamaki , et al. A	2019-08-27
Elastic membrane, substrate holding apparatus, and polishing apparatus Grant 10,213,896 - Fukushima , et al. Feb	2019-02-26
Polishing device and polishing method Grant 9,999,956 - Namiki , et al. June 19, 2	2018-06-19
Substrate Polishing Method, Top Ring, And Substrate Polishing Apparatus App 20170266779 - ISONO; Shintaro ; et al.	2017-09-21
Polishing Apparatus, Control Method And Recording Medium App 20170173756 - YAMAKI; Satoru ; et al.	2017-06-22
Elastic Membrane, Substrate Holding Apparatus, And Polishing Apparatus App 20170144267 - FUKUSHIMA; Makoto ; et al.	2017-05-25
Elastic membrane, substrate holding apparatus, and polishing apparatus Grant 9,573,244 - Fukushima , et al. February 21, 2	2017-02-21
Polishing Device And Polishing Method App 20150273650 - Namiki; Keisuke ; et al.	2015-10-01
Elastic Membrane, Substrate Holding Apparatus, And Polishing Apparatus App 20150273657 - FUKUSHIMA; Makoto ; et al.	2015-10-01

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