Ishizuka; Shuuichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ishizuka; Shuuichi.The latest application filed is for "method for in-chamber preprocessing in plasma nitridation processing, plasma processing method, and plasma processing apparatus".

Company Profile

0.8.10

Ishizuka; Shuuichi - Nirasaki N/A JP
Ishizuka; Shuuichi - Yamanashi-ken JP
Ishizuka; Shuuichi - Nirasaki-shi JP
Ishizuka; Shuuichi - Yamanashi JP
Ishizuka, Shuuichi - Hosaka-cho Nirasaki-shi Yamanashi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process chamber cleaning method in substrate processing apparatus, substrate processing apparatus, and substrate processing method Grant 8,608,901 - Ishizuka , et al. December 17, 2	2013-12-17
Plasma process device and plasma process method Grant 8,394,231 - Takatsuki , et al. March 12, 2	2013-03-12
Method of forming gate insulation film, semiconductor device, and computer recording medium Grant 7,915,177 - Nishita , et al. March 29, 2	2011-03-29
Method of measuring nitrogen concentration, method of forming silicon oxynitride film, and method of manufacturing semiconductor device. Grant 7,842,621 - Katsuki , et al. November 30, 2	2010-11-30
Method For In-chamber Preprocessing In Plasma Nitridation Processing, Plasma Processing Method, And Plasma Processing Apparatus App 20100239781 - Sano; Masaki ; et al.	2010-09-23
Process Chamber Cleaning Method In Substrate Processing Apparatus, Substrate Processing Apparatus, And Substrate Processing Method App 20100154707 - Ishizuka; Shuuichi ; et al.	2010-06-24
Method Of Forming Gate Insulation Film, Semiconductor Device, And Computer Recording Medium App 20100130023 - Nishita; Tatsuo ; et al.	2010-05-27
Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate Grant 7,695,763 - Ishizuka , et al. April 13, 2	2010-04-13
Method of forming gate insulating film, semiconductor device and computer recording medium Grant 7,674,722 - Nishita , et al. March 9, 2	2010-03-09
Method Of Measuring Nitrogen Content, Method Of Forming Silicon Oxynitride Film And Process For Producing Semiconductor Device App 20090253221 - Katsuki; Jiro ; et al.	2009-10-08
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device App 20090239364 - Nishita; Tatsuo ; et al.	2009-09-24
Method of Forming Gate Insulating Film, Semiconductor Device and Computer Recording Medium App 20070290247 - Nishita; Tatsuo ; et al.	2007-12-20
Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate App 20070181145 - Ishizuka; Shuuichi ; et al.	2007-08-09
Plasma process device and plasma process method App 20070131171 - Takatsuki; Koichi ; et al.	2007-06-14
Plasma processing device and plasma processing method App 20040127033 - Takatsuki, Koichi ; et al.	2004-07-01
Processing apparatus and cleaning method App 20040065344 - Oka, Shinsuke ; et al.	2004-04-08

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