Ishizuka; Shuichi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ishizuka; Shuichi.The latest application filed is for "plasma film forming method and plasma film forming apparatus".
- Ishizuka; Shuichi - Tsukui-Gun JP
- Ishizuka; Shuichi - Shiroyama-Machi JP
- Ishizuka; Shuichi - Kanagawa-ken JP
- Ishizuka; Shuichi - Shiroyamamachi JP
- Ishizuka; Shuichi - Nirasaki JP
| Patent | Date |
|---|---|
| Process for the production of semiconductor device Grant 6,727,182 - Akahori , et al. April 27, 2 | 2004-04-27 |
| Method for producing insulator film Grant 6,419,985 - Ishizuka July 16, 2 | 2002-07-16 |
| Plasma film forming method and plasma film forming apparatus Grant 6,355,902 - Akahori , et al. March 12, 2 | 2002-03-12 |
| Plasma film forming method and plasma film forming apparatus App 20010020608 - Akahori, Takashi ; et al. | 2001-09-13 |
| Process For The Production Of Semiconductor Device App 20010001741 - AKAHORI, TAKASHI ; et al. | 2001-05-24 |
| Plasma treating device Grant 6,087,614 - Ishizuka , et al. July 11, 2 | 2000-07-11 |
| Plasma film forming method and apparatus and plasma processing apparatus Grant 5,531,834 - Ishizuka , et al. July 2, 1 | 1996-07-02 |
| Plasma processing apparatus using vertical gas inlets one on top of another Grant 5,522,934 - Suzuki , et al. June 4, 1 | 1996-06-04 |
| Etching apparatus and method therefor Grant 5,476,182 - Ishizuka , et al. December 19, 1 | 1995-12-19 |
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