ISHIZAKA; Nobuyoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for ISHIZAKA; Nobuyoshi.The latest application filed is for "arithmetic model generation system, wear amount estimation system, and arithmetic model generation method".

Company Profile

0.6.12

ISHIZAKA; Nobuyoshi - Hyogo JP
Ishizaka; Nobuyoshi - Osaka-shi JP
Ishizaka; Nobuyoshi - Osaka N/A JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Arithmetic Model Generation System, Wear Amount Estimation System, And Arithmetic Model Generation Method App 20210402829 - ISHIZAKA; Nobuyoshi ; et al.	2021-12-30
Artificial Soil Particle, And Method For Producing Artificial Soil Particle App 20160083555 - Ishizaka; Nobuyoshi	2016-03-24
Artificial Soil Medium App 20150319945 - ISHIZAKA; Nobuyoshi	2015-11-12
Polishing pad, manufacturing method therefor, and method for manufacturing a semiconductor device Grant 9,181,386 - Doura , et al. November 10, 2	2015-11-10
Artificial Soil Aggregate And Artificial Soil Medium App 20150313102 - Ishizaka; Nobuyoshi	2015-11-05
Artificial Soil Medium App 20150291480 - Nakajima; Sachiko ; et al.	2015-10-15
Polishing pad and method for producing same Grant 9,156,127 - Fukuda , et al. October 13, 2	2015-10-13
Artificial Soil Particle, Artificial Soil Aggregate, And Artificial Soil Molded Product, And Greening Sheet, Wall Greening Panel And Horticultural Block Using Artificial Soil Molded Product App 20150230419 - Ishizaka; Nobuyoshi ; et al.	2015-08-20
Artificial Soil And Method Of Making The Same App 20150128671 - Ishizaka; Nobuyoshi	2015-05-14
Polishing pad, production method for same, and production method for glass substrate Grant 8,979,611 - Sato , et al. March 17, 2	2015-03-17
Polishing Pad, Production Method For Same, And Production Method For Glass Substrate App 20130078892 - Sato; Akinori ; et al.	2013-03-28
Polishing Pad, Manufacturing Method Therefor, And Method For Manufacturing A Semiconductor Device App 20130035021 - Doura; Masato ; et al.	2013-02-07
Polishing Pad And Method For Producing Same App 20110256817 - Fukuda; Takeshi ; et al.	2011-10-20

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