Ishiyama; Toshiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ishiyama; Toshiro.The latest application filed is for "projection optical system, exposure apparatus, and device production method".
- Ishiyama; Toshiro - Saitama JP
- Ishiyama, Toshiro - Saitama-shi JP
- Ishiyama; Toshiro - Kawasaki JP
- Ishiyama; Toshiro - Tokyo JP
| Patent | Date |
|---|---|
| Projection optical system, exposure apparatus, and device production method Grant 7,154,585 - Shigematsu , et al. December 26, 2 | 2006-12-26 |
| Projection optical system, exposure apparatus, and device production method App 20040009415 - Shigematsu, Koji ; et al. | 2004-01-15 |
| Catadioptric system for photolithography Grant 5,771,125 - Ishiyama June 23, 1 | 1998-06-23 |
| Catadioptric reduction projection optical system and exposure apparatus employing the same Grant 5,694,241 - Ishiyama , et al. December 2, 1 | 1997-12-02 |
| Catadioptric reduction projection optical system Grant 5,668,673 - Suenaga , et al. September 16, 1 | 1997-09-16 |
| Catadioptric optical system Grant 5,592,329 - Ishiyama , et al. January 7, 1 | 1997-01-07 |
| Inverse telescopic wide angle lens Grant 5,477,388 - Ishiyama , et al. December 19, 1 | 1995-12-19 |
| Inverse telescopic wide angle lens Grant 5,321,554 - Ishiyama , et al. June 14, 1 | 1994-06-14 |
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