Ishimura; Hiroaki
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ishimura; Hiroaki.The latest application filed is for "semiconductor device manufacturing method".
- Ishimura; Hiroaki - Kudamatsu JP
- ISHIMURA; Hiroaki - Kudamatsu-shi JP
- Ishimura; Hiroaki - Yamaguchi JP
| Patent | Date |
|---|---|
| Semiconductor device manufacturing method Grant 9,099,349 - Kofuji , et al. August 4, 2 | 2015-08-04 |
| Plasma processing method Grant 9,018,075 - Ito , et al. April 28, 2 | 2015-04-28 |
| Semiconductor Device Manufacturing Method App 20140175534 - KOFUJI; Naoyuki ; et al. | 2014-06-26 |
| Plasma Etching Method App 20140151327 - UNE; Satoshi ; et al. | 2014-06-05 |
| Plasma processing method Grant 8,486,291 - Ohmori , et al. July 16, 2 | 2013-07-16 |
| Plasma Processing Method App 20130164911 - ITO; Toru ; et al. | 2013-06-27 |
| Dry etching method Grant 8,207,066 - Inoue , et al. June 26, 2 | 2012-06-26 |
| Plasma Processing Method App 20120125890 - OHMORI; Takeshi ; et al. | 2012-05-24 |
| Dry Etching Method App 20100255612 - INOUE; Yoshiharu ; et al. | 2010-10-07 |
| Plasma processing method and plasma processing apparatus Grant 7,224,568 - Ishimura , et al. May 29, 2 | 2007-05-29 |
| Plasma processing method for working the surface of semiconductor devices Grant 7,098,138 - Arase , et al. August 29, 2 | 2006-08-29 |
| Plasma processing method and plasma processing apparatus App 20060171093 - Ishimura; Hiroaki ; et al. | 2006-08-03 |
| Plasma processing method for working the surface of semiconductor devices App 20060048892 - Arase; Takao ; et al. | 2006-03-09 |
| Plasma processing method for working the surface of semiconductor devices App 20040175940 - Arase, Takao ; et al. | 2004-09-09 |
| Method for manufacturing semiconductor device Grant 6,709,984 - Saito , et al. March 23, 2 | 2004-03-23 |
| Method for manufacturing semiconductor device App 20040048477 - Saito, Go ; et al. | 2004-03-11 |
| Method For Manufacturing Semiconductor Device App 20040033695 - Saito, Go ; et al. | 2004-02-19 |
| Plasma processing method for working the surface of semiconductor devices Grant 6,617,255 - Arase , et al. September 9, 2 | 2003-09-09 |
| Plasma processing method for working the surface of semiconductor devices App 20010055885 - Arase, Takao ; et al. | 2001-12-27 |
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