ISHIDA; Yasuto

Patent Applications and Registrations

Patent applications and USPTO patent grants for ISHIDA; Yasuto.The latest application filed is for "intermediate raw material, and polishing composition and composition for surface treatment using the same".

Company Profile

9.12.18

ISHIDA; Yasuto - Kiyosu-shi JP
Ishida; Yasuto - Kiyosu JP
Ishida; Yasuto - Aichi JP
Ishida; Yasuto - Miaoli County CN
Ishida; Yasuto - Kakamigahara N/A JP
ISHIDA; Yasuto - Kakamigahara-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Intermediate Raw Material, And Polishing Composition And Composition For Surface Treatment Using The Same App 20220010207 - YOSHINO; Tsutomu ; et al.	2022-01-13
Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate Grant 11,203,731 - Ishida December 21, 2	2021-12-21
Composition for surface treatment, method for producing composition for surface treatment, surface treatment method, and method for producing semiconductor substrate Grant 11,162,057 - Yoshino , et al. November 2, 2	2021-11-02
Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate Grant 11,028,340 - Ishida , et al. June 8, 2	2021-06-08
Composition For Surface Treatment And Method Of Producing The Same, Surface Treatment Method, And Method Of Producing Semiconductor Substrate App 20210130735 - ISHIDA; Yasuto	2021-05-06
Composition for surface treatment and surface treatment method using the same Grant 10,954,479 - Ishida March 23, 2	2021-03-23
Surface Treatment Composition, Method For Producing Surface Treatment Composition, Surface Treatment Method, And Method For Producing Semiconductor Substrate App 20210071111 - YOSHINO; Tsutomu ; et al.	2021-03-11
Surface treatment composition, method of producing surface treatment composition, method of treating surface, and method of producing semiconductor substrate Grant 10,916,435 - Ishida February 9, 2	2021-02-09
Surface Treatment Composition, Method For Producing Surface Treatment Composition, Surface Treatment Method, And Method For Producing Semiconductor Substrate App 20210005462 - YOSHINO; Tsutomu ; et al.	2021-01-07
Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate Grant 10,876,082 - Yarita , et al. December 29, 2	2020-12-29
Composition for surface treatment, and method for surface treatment using the same Grant 10,876,073 - Ishida December 29, 2	2020-12-29
Polishing Composition App 20200308449 - MAE; Ryota ; et al.	2020-10-01
Polishing Composition App 20200299543 - ISHIDA; Yasuto	2020-09-24
Composition for surface treatment and method for surface treatment using the same Grant 10,781,410 - Ishida , et al. Sept	2020-09-22
Surface Treatment Composition, Method Of Producing Surface Treatment Composition, Method Of Treating Surface, And Method Of Producing Semiconductor Substrate App 20200294808 - Ishida; Yasuto	2020-09-17
Intermediate Raw Material, And Polishing Composition And Composition For Surface Treatment Using The Same App 20200095467 - YOSHINO; Tsutomu ; et al.	2020-03-26
Composition For Surface Treatment, Method For Producing The Same, Surface Treatment Method Using Composition For Surface Treatme App 20200024547 - ISHIDA; Yasuto ; et al.	2020-01-23
Composition For Surface Treatment, Method For Producing The Same, Surface Treatment Method Using Composition For Surface Treatme App 20200017719 - ISHIDA; Yasuto ; et al.	2020-01-16
Composition For Surface Treatment And Surface Treatment Method Using The Same App 20190241842 - ISHIDA; Yasuto	2019-08-08
Composition For Surface Treatment, And Method For Surface Treatment Using The Same App 20190177656 - ISHIDA; Yasuto	2019-06-13
Composition For Surface Treatment, Method For Producing Composition For Surface Treatment, Surface Treatment Method, And Method For Producing Semiconductor Substrate App 20190093056 - YOSHINO; TSUTOMU ; et al.	2019-03-28
Composition For Surface Treatment And Method For Surface Treatment Using The Same App 20190085271 - ISHIDA; YASUTO ; et al.	2019-03-21
Surface Treatment Composition, Method For Producing Surface Treatment Composition, Surface Treatment Method, And Method For Producing Semiconductor Substrate App 20190085270 - YARITA; SATORU ; et al.	2019-03-21
Polishing composition and polishing method Grant 10,093,834 - Ishida October 9, 2	2018-10-09
Polishing Composition And Polishing Method App 20170298253 - ISHIDA; Yasuto	2017-10-19
Polishing composition Grant 9,486,892 - Onishi , et al. November 8, 2	2016-11-08
Polishing Composition App 20150344738 - ONISHI; Shogo ; et al.	2015-12-03
Polishing composition and polishing method using the same Grant 8,703,007 - Akatsuka , et al. April 22, 2	2014-04-22
Polishing Composition and Polishing Method Using the Same App 20110180511 - AKATSUKA; Tomohiko ; et al.	2011-07-28

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