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name:-0.0005950927734375
name:-0.0074470043182373
name:-0.00074005126953125
Ishida; Nobumasa Patent Filings

Ishida; Nobumasa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ishida; Nobumasa.The latest application filed is for "electroless copper plating solution and process for formation of copper film".

Company Profile
0.7.0
  • Ishida; Nobumasa - Chiryu JP
  • Ishida; Nobumasa - Nagoya JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Electroless copper plating solution and process for formation of copper film
Grant 5,965,211 - Kondo , et al. October 12, 1
1999-10-12
Method and an apparatus for detecting concentration of a chemical treating solution and an automatic control apparatus thereof
Grant 5,450,870 - Suga , et al. September 19, 1
1995-09-19
Semiconductor element-mounting printed board
Grant 5,248,853 - Ishikawa , et al. September 28, 1
1993-09-28
Electroless copper plating solution and process for formation of copper film
Grant 5,039,338 - Kondo , et al. August 13, 1
1991-08-13
Electroless copper plating solution
Grant 4,956,014 - Kondo , et al. * September 11, 1
1990-09-11
Electroless copper plating solution
Grant 4,814,009 - Kondo , et al. March 21, 1
1989-03-21
Gypsum moldings as building materials and methods manufacturing the said gypsum moldings
Grant 4,239,716 - Ishida , et al. December 16, 1
1980-12-16

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