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name:-0.016952991485596
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Ishida; Hidetsugu Patent Filings

Ishida; Hidetsugu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ishida; Hidetsugu.The latest application filed is for "semiconductor device having buried boron and carbon regions, and method of manufacture thereof".

Company Profile
0.3.0
  • Ishida; Hidetsugu - Kotaira JP
  • Ishida; Hidetsugu - Kodaira JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor device having buried boron and carbon regions, and method of manufacture thereof
Grant 6,635,950 - Ishida , et al. October 21, 2
2003-10-21
Semiconductor device having buried boron and carbon regions
Grant 6,198,157 - Ishida , et al. March 6, 2
2001-03-06
Inspection method, inspection apparatus and method of production of semiconductor device using them
Grant 5,936,726 - Takeda , et al. August 10, 1
1999-08-10

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