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Patent applications and USPTO patent grants for Ishibashi; Miwako.The latest application filed is for "water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for impart".
Patent | Date |
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Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method Grant 8,679,727 - Terai , et al. March 25, 2 | 2014-03-25 |
Water Repellant Composition For Substrate To Be Exposed, Method For Forming Resist Pattern, Electronic Device Produced By The Formation Method, Treatment Method For Imparting Water Repellency To Substrate To Be Exposed, Water Repellant Set For Substrate To Be Exposed, And Treatment Method For Impart App 20110221077 - Ishibashi; Takeo ;   et al. | 2011-09-15 |
Developing Method For Immersion Lithography, Solvent Used For The Developing Method And Electronic Device Using The Developing Method App 20100021703 - Terai; Mamoru ;   et al. | 2010-01-28 |
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