ISHIBASHI; Ken

Patent Applications and Registrations

Patent applications and USPTO patent grants for ISHIBASHI; Ken.The latest application filed is for "composition for resist pattern metallization process".

Company Profile

4.0.9

ISHIBASHI; Ken - Toyama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition For Resist Pattern Metallization Process App 20220206395 - SHIBAYAMA; Wataru ; et al.	2022-06-30
Film-forming Composition App 20220187709 - SHIBAYAMA; Wataru ; et al.	2022-06-16
Film-forming Composition App 20220177653 - SHIBAYAMA; Wataru ; et al.	2022-06-09
Film Forming Composition App 20220100092 - SHIBAYAMA; Wataru ; et al.	2022-03-31
Film-forming Composition App 20210395462 - SHIBAYAMA; Wataru ; et al.	2021-12-23
Semiconductor Device Production Method Employing Silicon-containing Resist Underlayer Film-forming Composition Including Organic Group Having Ammonium Group App 20210181635 - SHIBAYAMA; Wataru ; et al.	2021-06-17
Composition For Forming Photocurable Silicon-containing Coating Film App 20210054231 - SHIBAYAMA; Wataru ; et al.	2021-02-25
Silicon-containing Resist Underlayer Film-forming Composition Which Contains Protected Phenolic Group And Nitric Acid App 20210018840 - SHIBAYAMA; Wataru ; et al.	2021-01-21
Silicon-containing Resist Underlayer Film-forming Composition Containing Organic Group Having Dihydroxy Group App 20190265593 - SHIBAYAMA; Wataru ; et al.	2019-08-29

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