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Patent applications and USPTO patent grants for Isago; Masaru.The latest application filed is for "heat medium circulation system and substrate processing apparatus".
Patent | Date |
---|---|
Plasma processing apparatus Grant 11,367,595 - Isago June 21, 2 | 2022-06-21 |
Heat Medium Circulation System And Substrate Processing Apparatus App 20210074519 - ISAGO; Masaru ;   et al. | 2021-03-11 |
Method of cleaning plasma processing apparatus Grant 10,553,409 - Murakami , et al. Fe | 2020-02-04 |
Processing Apparatus And Method For Controlling Processing Apparatus App 20190318914 - OKUNISHI; Naohiko ;   et al. | 2019-10-17 |
Plasma Processing Apparatus App 20180374722 - Isago; Masaru | 2018-12-27 |
Method Of Cleaning Plasma Processing Apparatus App 20180330930 - MURAKAMI; Hiraku ;   et al. | 2018-11-15 |
Etching method and etching apparatus Grant 9,728,418 - Toyoda , et al. August 8, 2 | 2017-08-08 |
Etching Method And Etching Apparatus App 20160079074 - TOYODA; Keigo ;   et al. | 2016-03-17 |
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