Irumata; Shuichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Irumata; Shuichi.The latest application filed is for "method for manufacturing sputtering target".

Company Profile

1.10.12

Irumata; Shuichi - Tokyo JP
Irumata; Shuichi - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for manufacturing sputtering target Grant 10,844,475 - Irumata , et al. November 24, 2	2020-11-24
Method for Manufacturing Sputtering Target App 20180127866 - Irumata; Shuichi ; et al.	2018-05-10
Barrier film for flexible copper substrate and sputtering target for forming barrier film Grant 8,318,314 - Irumata , et al. November 27, 2	2012-11-27
Hafnium alloy target Grant 8,262,816 - Okabe , et al. September 11, 2	2012-09-11
Hafnium alloy target Grant 8,241,438 - Okabe , et al. August 14, 2	2012-08-14
Hafnium alloy target and process for producing the same Grant 8,062,440 - Okabe , et al. November 22, 2	2011-11-22
Barrier Film for Flexible Copper Substrate and Sputtering Target for Forming Barrier Film App 20100089622 - Irumata; Shuichi ; et al.	2010-04-15
Hafnium silicide target for forming gate oxide film, and method for preparation thereof Grant 7,674,446 - Irumata , et al. March 9, 2	2010-03-09
Cu-Mn Alloy Sputtering Target and Semiconductor Wiring App 20100013096 - Irumata; Shuichi ; et al.	2010-01-21
Hafnium Silicide Target for Forming Gate Oxide Film, and Method for Preparation Thereof App 20090194898 - Irumata; Shuichi ; et al.	2009-08-06
Hafnium silicide target for forming gate oxide film and method for preparation thereof Grant 7,517,515 - Irumata , et al. April 14, 2	2009-04-14
Hafnium Alloy Target and Process for Producing the Same App 20090057142 - Okabe; Takeo ; et al.	2009-03-05
Hafnium Alloy Target and Process for Producing the Same App 20090050475 - Okabe; Takeo ; et al.	2009-02-26
Hafnium Alloy Target and Process for Producing the Same App 20090000704 - Okabe; Takeo ; et al.	2009-01-01
Hafnium alloy target and process for producing the same Grant 7,459,036 - Okabe , et al. December 2, 2	2008-12-02
Barrier Film For Flexible Copper Substrate And Sputtering Target For Forming Barrier Film App 20070209547 - Irumata; Shuichi ; et al.	2007-09-13
Hafnium silicide target for gate oxide film formation and its production method Grant 7,241,368 - Irumata , et al. July 10, 2	2007-07-10
Hafnium alloy target and process for producing the same App 20060189164 - Okabe; Takeo ; et al.	2006-08-24
Hafnium silicide target and manufacturing method for preparation thereof Grant 6,986,834 - Irumata , et al. January 17, 2	2006-01-17
Hafnium silicide target and manufacturing method for preparation thereof App 20040195094 - Irumata, Shuichi ; et al.	2004-10-07
Hafnium silicide target for forming gate oxide film and method for preparation thereof App 20040170552 - Irumata, Shuichi ; et al.	2004-09-02
Hafnium silicide target for gate oxide film formation and its production method App 20030155229 - Irumata, Shuichi ; et al.	2003-08-21

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