Irie; Shigeo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Irie; Shigeo.The latest application filed is for "photomask blank, photomask blank making method, and photomask making method".

Company Profile

2.11.13

Irie; Shigeo - Joetsu JP
IRIE; Shigeo - Joetsu-shi JP
Irie; Shigeo - Niigata JP
Irie; Shigeo - Toyama JP
IRIE; Shigeo - Leuven BE
Irie; Shigeo - Kyoto JP
Irie, Shigeo - Kyoto-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photomask blank, photomask blank making method, and photomask making method Grant 11,073,756 - Kosaka , et al. July 27, 2	2021-07-27
Photomask blank and making method Grant 11,061,319 - Kosaka , et al. July 13, 2	2021-07-13
Photomask blank, method for manufacturing photomask, and mask pattern formation method Grant 10,585,345 - Irie , et al.	2020-03-10
Photomask Blank, Photomask Blank Making Method, And Photomask Making Method App 20190033703 - KOSAKA; Takuro ; et al.	2019-01-31
Photomask Blank And Making Method App 20180356721 - KOSAKA; Takuro ; et al.	2018-12-13
Photomask Blank, Method For Manufacturing Photomask, And Mask Pattern Formation Method App 20180267398 - IRIE; Shigeo ; et al.	2018-09-20
Photo mask and method for forming pattern using the same Grant 9,291,889 - Yoshioka , et al. March 22, 2	2016-03-22
Photo Mask And Method For Forming Pattern Using The Same App 20140308604 - YOSHIOKA; Yoshimasa ; et al.	2014-10-16
Photomask and pattern formation method using the same Grant 8,278,014 - Irie , et al. October 2, 2	2012-10-02
Reflective Photomask, Manufacturing Method Of The Photomask, And Pattern Formation Method App 20110287344 - IRIE; Shigeo	2011-11-24
Photomask And Pattern Formation Method Using The Same App 20110262849 - IRIE; Shigeo ; et al.	2011-10-27
Photomask and pattern formation method using the same Grant 8,007,959 - Nonami , et al. August 30, 2	2011-08-30
Photomask and pattern formation method using the same Grant 7,998,641 - Irie , et al. August 16, 2	2011-08-16
Photomask And Pattern Formation Method Using The Same App 20090061330 - Irie; Shigeo ; et al.	2009-03-05
Photomask And Pattern Formation Method Using The Same App 20090061328 - NONAMI; Yuji ; et al.	2009-03-05
Exposure method and apparatus Grant 6,984,472 - Irie January 10, 2	2006-01-10
Pattern forming method and apparatus for fabricating semiconductor device Grant 6,966,710 - Irie November 22, 2	2005-11-22
Pattern forming method and apparatus for fabricating semiconductor device Grant 6,855,485 - Irie February 15, 2	2005-02-15
Pattern forming method and apparatus for fabricating semiconductor device App 20040213563 - Irie, Shigeo	2004-10-28
Exposure method and apparatus App 20040196446 - Irie, Shigeo	2004-10-07
Method for light exposure Grant 6,677,108 - Matsuzawa , et al. January 13, 2	2004-01-13
Method for light exposure App 20020119401 - Matsuzawa, Nobuyuki ; et al.	2002-08-29
Exposure method and apparatus App 20010055104 - Irie, Shigeo	2001-12-27
Pattern forming method and apparatus for fabricating semiconductor device App 20010055731 - Irie, Shigeo	2001-12-27

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