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Optical Lithography Correction Process
App 20110154281 - Zach; Franz Xaver | 2011-06-23 |
Calibration on wafer sweet spots
Grant 7,444,615 - Percin , et al. October 28, 2 | 2008-10-28 |
Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design
Grant 7,401,319 - Horng , et al. July 15, 2 | 2008-07-15 |
Method for real time monitoring and verifying optical proximity correction model and method
Grant 7,392,502 - Percin , et al. June 24, 2 | 2008-06-24 |
Apparatus and method for characterizing an image system in lithography projection tool
Grant 7,379,170 - Huang , et al. May 27, 2 | 2008-05-27 |
System and method for reducing patterning variability in integrated circuit manufacturing through mask layout corrections
Grant 7,318,214 - Prasad , et al. January 8, 2 | 2008-01-08 |
Method of characterizing flare
Grant 7,277,165 - Wu , et al. October 2, 2 | 2007-10-02 |
Correcting design data for manufacture
Grant 7,275,225 - Kamat September 25, 2 | 2007-09-25 |
Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes
Grant 7,266,800 - Sezginer September 4, 2 | 2007-09-04 |
Method for correcting position-dependent distortions in patterning of integrated circuits
Grant 7,246,343 - Joshi , et al. July 17, 2 | 2007-07-17 |
Method of compensating photomask data for the effects of etch and lithography processes
App 20070143733 - Zach; Franz X. ; et al. | 2007-06-21 |
Method for measuring and verifying stepper illumination
Grant 7,224,437 - Percin , et al. May 29, 2 | 2007-05-29 |
Characterizing flare of a projection lens
Grant 7,189,481 - Wu , et al. March 13, 2 | 2007-03-13 |
Method for real time monitoring and verifying optical proximity correction model and method
App 20070006116 - Percin; Gokhan ; et al. | 2007-01-04 |
Method for verifying and choosing lithography model
App 20060282814 - Percin; Gokhan ; et al. | 2006-12-14 |
Calibration on wafer sweet spots
App 20060266243 - Percin; Gokhan ; et al. | 2006-11-30 |
Method for measuring and verifying stepper illumination
App 20060268254 - Percin; Gokhan ; et al. | 2006-11-30 |
Apparatus and method for characterizing an image system in lithography projection tool
App 20060251994 - Huang; Hsu-Ting ; et al. | 2006-11-09 |
Apparatus and method for compensating a lithography projection tool
App 20060248497 - Huang; Hsu-Ting ; et al. | 2006-11-02 |
Method and apparatus of model-based photomask synthesis
App 20060248495 - Sezginer; Abdurrahman | 2006-11-02 |
Apparatus and method for breaking up and merging polygons
App 20060248499 - Sezginer; Abdurrahman ; et al. | 2006-11-02 |
Apparatus and method for photomask design
App 20060248498 - Sezginer; Abdurrahman ; et al. | 2006-11-02 |
Apparatus and method for segmenting edges for optical proximity correction
App 20060248496 - Sezginer; Abdurrahman ; et al. | 2006-11-02 |
Optical lithography correction process
App 20060236271 - Zach; Franz Xaver | 2006-10-19 |
Optical lithography verification process
App 20060228041 - Joshi; Devendra | 2006-10-12 |
Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design
App 20060143589 - Horng; Chi-Song ; et al. | 2006-06-29 |
Method and system for managing design corrections for optical and process effects based on feature tolerances
App 20060075379 - Kamat; Vishnu Govind | 2006-04-06 |
Method and system for semiconductor design hierarchy analysis and transformation
App 20060075371 - Kamat; Vishnu Govind | 2006-04-06 |
Method for correcting position-dependent distortions in patterning of integrated circuits
App 20060048091 - Joshi; Devendra ; et al. | 2006-03-02 |
Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes
App 20050273753 - Sezginer, Abdurrahman | 2005-12-08 |
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