Inazawa; Rie
Patent Applications and Registrations
Patent applications and USPTO patent grants for Inazawa; Rie.The latest application filed is for "method and apparatus for multilayer photoresist dry development".
- Inazawa; Rie - Hokuto JP
- INAZAWA; Rie - Hokuto-shi JP
- Inazawa, Rie - Yamanashi JP
- Inazawa, Rie - Yamanashi-ken JP
| Patent | Date |
|---|---|
| Method and apparatus for multilayer photoresist dry development Grant 8,048,325 - Balasubramaniam , et al. November 1, 2 | 2011-11-01 |
| Method and apparatus for multilayer photoresist dry development App 20080128388 - BALASUBRAMANIAM; Vaidyanathan ; et al. | 2008-06-05 |
| Low-pressure removal of photoresist and etch residue App 20060154486 - Balasubramaniam; Vaidyanathan ; et al. | 2006-07-13 |
| Low-pressure removal of photoresist and etch residue App 20060144817 - Balasubramaniam; Vaidyanathan ; et al. | 2006-07-06 |
| Etching method and plasma etching apparatus App 20050103441 - Honda, Masanobu ; et al. | 2005-05-19 |
| Etching method App 20050085077 - Ogawa, Kazuto ; et al. | 2005-04-21 |
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