Inazawa; Koichiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Inazawa; Koichiro.The latest application filed is for "plasma etching unit".
Company Profile
0.22.22
- Inazawa; Koichiro - Yamanashi-Ken N/A JP
- Inazawa; Koichiro - Peabody MA
- Inazawa; Koichiro - Yamanashi JP
- Inazawa; Koichiro - Beverly MA
- Inazawa; Koichiro - Nirasaki JP
- Inazawa, Koichiro - Nirasaki-shi JP
- Inazawa; Koichiro - Tokyo JP
- Inazawa; Koichiro - Tokyo-To JP
Patent Activity
| Patent | Date |
|---|---|
| Plasma etching unit Grant 8,840,753 - Honda , et al. September 23, 2 | 2014-09-23 |
| Method and apparatus for multilayer photoresist dry development Grant 8,048,325 - Balasubramaniam , et al. November 1, 2 | 2011-11-01 |
| Low-pressure removal of photoresist and etch residue Grant 7,700,494 - Balasubramaniam , et al. April 20, 2 | 2010-04-20 |
| Plasma Etching Unit App 20100024983 - Honda; Masanobu ; et al. | 2010-02-04 |
| Plasma etching method and plasma etching unit Grant 7,625,494 - Honda , et al. December 1, 2 | 2009-12-01 |
| Etching method Grant 7,582,220 - Ishikawa , et al. September 1, 2 | 2009-09-01 |
| Etching method Grant 7,517,468 - Ogawa , et al. April 14, 2 | 2009-04-14 |
| Method and apparatus for multilayer photoresist dry development App 20080128388 - BALASUBRAMANIAM; Vaidyanathan ; et al. | 2008-06-05 |
| Low-pressure removal of photoresist and etch residue Grant 7,344,993 - Balasubramaniam , et al. March 18, 2 | 2008-03-18 |
| Method and apparatus for multilayer photoresist dry development Grant 7,344,991 - Balasubramaniam , et al. March 18, 2 | 2008-03-18 |
| Method of etching dual damascene structure Grant 7,326,650 - Kihara , et al. February 5, 2 | 2008-02-05 |
| Etching method and plasma processing method Grant 7,211,197 - Hagihara , et al. May 1, 2 | 2007-05-01 |
| Method for fabricating a semiconductor device Grant 7,163,887 - Kudo , et al. January 16, 2 | 2007-01-16 |
| Etching method Grant 7,125,806 - Harada , et al. October 24, 2 | 2006-10-24 |
| Semiconductor device and manufacturing method thereof Grant 7,119,011 - Harada , et al. October 10, 2 | 2006-10-10 |
| Low-pressure removal of photoresist and etch residue App 20060154486 - Balasubramaniam; Vaidyanathan ; et al. | 2006-07-13 |
| Low-pressure removal of photoresist and etch residue App 20060144817 - Balasubramaniam; Vaidyanathan ; et al. | 2006-07-06 |
| Etching method App 20060118517 - Ogawa; Shuhei ; et al. | 2006-06-08 |
| Etching method Grant 7,030,028 - Mori , et al. April 18, 2 | 2006-04-18 |
| Dry developing method Grant 6,986,851 - Kitamura , et al. January 17, 2 | 2006-01-17 |
| Method and apparatus for removing photoresist from a substrate App 20050136681 - Balasubramaniam, Vaidyanathan ; et al. | 2005-06-23 |
| Method and apparatus for etching an organic layer App 20050136666 - Balasubramaniam, Vaidyanathan ; et al. | 2005-06-23 |
| Etching method and plasma etching apparatus App 20050103441 - Honda, Masanobu ; et al. | 2005-05-19 |
| Etching method App 20050085077 - Ogawa, Kazuto ; et al. | 2005-04-21 |
| Method for fabricating a semiconductor device App 20050020057 - Kudo, Hiroshi ; et al. | 2005-01-27 |
| Etching method and plasma processing method App 20050000939 - Hagihara, Masaaki ; et al. | 2005-01-06 |
| Semiconductor device and manufacturing method thereof App 20040256726 - Harada, Akitoshi ; et al. | 2004-12-23 |
| Plasma etching method and plasma etching unit App 20040219797 - Honda, Masanobu ; et al. | 2004-11-04 |
| Etching method App 20040209469 - Harada, Akitoshi ; et al. | 2004-10-21 |
| Method and apparatus for bilayer photoresist dry development App 20040185380 - Igarashi, Yoshiki ; et al. | 2004-09-23 |
| Method and apparatus for multilayer photoresist dry development App 20040180269 - Balasubramaniam, Vaidyanathan ; et al. | 2004-09-16 |
| Oxide film etching method App 20040173573 - Igarashi, Yoshiki ; et al. | 2004-09-09 |
| Dry developing method App 20040169009 - Kitamura, Akinori ; et al. | 2004-09-02 |
| Method of etching and method of plasma treatment Grant 6,780,342 - Hagihara , et al. August 24, 2 | 2004-08-24 |
| Etching method App 20040063331 - Mori, Takuya ; et al. | 2004-04-01 |
| Method of etching dual damascene structure App 20040026364 - Kihara, Yoshihide ; et al. | 2004-02-12 |
| Plasma processing method Grant 6,670,276 - Suemasa , et al. December 30, 2 | 2003-12-30 |
| Plasma processing apparatus and processing method App 20030102087 - Ito, Youbun ; et al. | 2003-06-05 |
| Oxide film etching method App 20020055263 - Igarashi, Yoshiki ; et al. | 2002-05-09 |
| Plasma etching apparatus Grant 5,772,833 - Inazawa , et al. June 30, 1 | 1998-06-30 |
| Etching process Grant 5,770,098 - Araki , et al. June 23, 1 | 1998-06-23 |
| Plasma process apparatus Grant 5,717,294 - Sakai , et al. February 10, 1 | 1998-02-10 |
| Plasma etching method Grant 5,595,627 - Inazawa , et al. January 21, 1 | 1997-01-21 |
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