loadpatents
name:-0.093070983886719
name:-0.071762084960938
name:-0.0042951107025146
Inanami; Ryoichi Patent Filings

Inanami; Ryoichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Inanami; Ryoichi.The latest application filed is for "mask and pattern forming method".

Company Profile
0.42.53
  • Inanami; Ryoichi - Yokohama JP
  • Inanami; Ryoichi - Kanagawa JP
  • Inanami; Ryoichi - Kanagawa-ken JP
  • Inanami; RYOICHI - Yokohama Kanagawa JP
  • INANAMI; Ryoichi - Yokohama-shi JP
  • Inanami; Ryoichi - Kawasaki JP
  • Inanami, Ryoichi - Kawasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device
Grant RE48,815 - Inanami , et al. November 9, 2
2021-11-09
Imprint recipe creating device and imprint device
Grant RE47,271 - Mikami , et al.
2019-03-05
Imprint pattern forming method
Grant RE47,093 - Tokue , et al. October 23, 2
2018-10-23
Drop recipe creating method, database creating method and medium
Grant RE46,901 - Matsuoka , et al. June 19, 2
2018-06-19
Pattern transfer mold and pattern formation method
Grant 9,957,630 - Li , et al. May 1, 2
2018-05-01
Pattern forming method, processing method, and processing apparatus
Grant RE46,390 - Asano , et al. May 2, 2
2017-05-02
Pattern formation method, mask for exposure, and exposure apparatus
Grant 9,329,490 - Sato , et al. May 3, 2
2016-05-03
Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method
Grant 9,188,879 - Kasa , et al. November 17, 2
2015-11-17
Mask And Pattern Forming Method
App 20150253659 - Inanami; RYOICHI ;   et al.
2015-09-10
Stage apparatus and process apparatus
Grant 9,021,983 - Inanami , et al. May 5, 2
2015-05-05
Pattern Formation Method, Mask For Exposure, And Exposure Apparatus
App 20150055113 - SATO; Takashi ;   et al.
2015-02-26
Pattern Formation Method, Mask For Pattern Formation, Method For Manufacturing Mask, And Pattern Formation Apparatus
App 20150053867 - INANAMI; Ryoichi ;   et al.
2015-02-26
Pattern Transfer Mold And Pattern Formation Method
App 20150021191 - LI; Yongfang ;   et al.
2015-01-22
Imprint recipe creating device and imprint device
Grant 8,740,377 - Mikami , et al. June 3, 2
2014-06-03
Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device
Grant 8,728,711 - Nakajima , et al. May 20, 2
2014-05-20
Template and method of manufacturing a semiconductor device
Grant 8,647,106 - Inanami , et al. February 11, 2
2014-02-11
Drop recipe creating method, database creating method and medium
Grant 8,560,977 - Matsuoka , et al. October 15, 2
2013-10-15
Substrate Holding Apparatus, Pattern Transfer Apparatus, And Pattern Transfer Method
App 20130222782 - KASA; Kentaro ;   et al.
2013-08-29
Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device
Grant 8,468,480 - Inanami , et al. June 18, 2
2013-06-18
Imprint pattern forming method
Grant 8,444,889 - Tokue , et al. May 21, 2
2013-05-21
Pattern forming method, processing method, and processing apparatus
Grant 8,420,422 - Asano , et al. April 16, 2
2013-04-16
Pattern Forming Apparatus
App 20130080991 - Inanami; Ryoichi ;   et al.
2013-03-28
Pattern Forming Apparatus
App 20130077066 - INANAMI; Ryoichi ;   et al.
2013-03-28
Transferring pattern onto semiconductor substrate using optimum transfer condition determined for each divided area
Grant 8,392,855 - Morinaga , et al. March 5, 2
2013-03-05
Stage Apparatus And Process Apparatus
App 20130014360 - INANAMI; Ryoichi ;   et al.
2013-01-17
Method Of Manufacturing Organic Thin Film Solar Cell
App 20120214272 - Azuma; Tsukasa ;   et al.
2012-08-23
Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device
Grant 8,227,151 - Inanami , et al. July 24, 2
2012-07-24
Template inspection method and manufacturing method for semiconductor device
Grant 8,227,267 - Yoneda , et al. July 24, 2
2012-07-24
Drop Recipe Creating Method, Database Creating Method And Medium
App 20120131056 - Matsuoka; Yasuo ;   et al.
2012-05-24
Imprinting Method, Imprinting Apparatus And Medium
App 20120129279 - MATSUOKA; Yasuo ;   et al.
2012-05-24
Imprinting Method, Semiconductor Integrated Circuit Manufacturing Method And Drop Recipe Creating Method
App 20120072003 - MATSUOKA; Yasuo ;   et al.
2012-03-22
Nanoimprint Template And Pattern Transcription Apparatus
App 20120068372 - Mimotogi; Akiko ;   et al.
2012-03-22
Imprint Apparatus And Imprint Method
App 20120049417 - INANAMI; Ryoichi
2012-03-01
Imprint Recipe Creating Device And Imprint Device
App 20120050441 - MIKAMI; Shinji ;   et al.
2012-03-01
Pattern Forming Method And Pattern Forming Device
App 20120049396 - Tsutsui; Tomohiro ;   et al.
2012-03-01
Inspecting Method, Template Manufacturing Method, Semiconductor Integrated Circuit Manufacturing Method, And Inspecting System
App 20120045854 - Matsuoka; Yasuo ;   et al.
2012-02-23
Reflective Mask, Manufacturing Method For Reflective Mask, And Manufacturing Method For Semiconductor Device
App 20120040293 - Inanami; Ryoichi ;   et al.
2012-02-16
Method For Forming Pattern And A Semiconductor Device
App 20120028378 - MORINAGA; Hiroyuki ;   et al.
2012-02-02
Reflective mask and manufacturing method for reflective mask
Grant 8,071,263 - Inanami , et al. December 6, 2
2011-12-06
Pattern Forming Method, Processing Method, And Processing Apparatus
App 20110229988 - ASANO; Masafumi ;   et al.
2011-09-22
Mark forming method and method for manufacturing semiconductor device
Grant 7,972,932 - Sato , et al. July 5, 2
2011-07-05
Cleaning Reticle, Method For Cleaning Reticle Stage, And Method For Manufacturing Semiconductor Device
App 20110159440 - NAKAJIMA; Yumi ;   et al.
2011-06-30
Semiconductor device manufacturing method
Grant 7,914,958 - Inanami , et al. March 29, 2
2011-03-29
Flare Correction Method, Method For Manufacturing Mask For Lithography, And Method For Manufacturing Semiconductor Device
App 20110065027 - INANAMI; Ryoichi ;   et al.
2011-03-17
Pattern Forming Apparatus And Pattern Forming Method
App 20100308485 - INANAMI; Ryoichi ;   et al.
2010-12-09
Template And Pattern Forming Method
App 20100308513 - Kashiwagi; Hiroyuki ;   et al.
2010-12-09
Template, Method Of Manufacturing The Same, And Method Of Forming Pattern
App 20100264113 - YONEDA; Ikuo ;   et al.
2010-10-21
Template And Method Of Manufacturing A Semiconductor Device
App 20100252188 - Inanami; Ryoichi ;   et al.
2010-10-07
Imprint Pattern Forming Method
App 20100244326 - Tokue; Hiroshi ;   et al.
2010-09-30
Method Of Designing A Template Pattern, Method Of Manufacturing A Template And Method Of Manufacturing A Semiconductor Device
App 20100237540 - INANAMI; Ryoichi ;   et al.
2010-09-23
Imprinting Mold And Pattern Formation Method
App 20100164146 - FURUTONO; Yohko ;   et al.
2010-07-01
Template Inspection Method And Manufacturing Method For Semiconductor Device
App 20100075443 - YONEDA; Ikuo ;   et al.
2010-03-25
Electron beam writing data creating method and electron beam writing data creating apparatus
Grant 7,683,352 - Inanami March 23, 2
2010-03-23
Reflective Mask, Manufacturing Method For Reflective Mask, And Manufacturing Method For Semiconductor Device
App 20100021826 - INANAMI; Ryoichi ;   et al.
2010-01-28
Semiconductor Device Manufacturing Method
App 20090305152 - INANAMI; Ryoichi ;   et al.
2009-12-10
Wafer Exposing Method, Euv Exposing Apparatus, And Eb Exposing Apparatus
App 20090305165 - INANAMI; Ryoichi ;   et al.
2009-12-10
Mark Forming Method And Method For Manufacturing Semiconductor Device
App 20090246891 - Sato; Takashi ;   et al.
2009-10-01
Charged-beam Exposure Apparatus Having An Improved Alignment Precision And Exposure Method
App 20090206280 - KOSHIBA; Takeshi ;   et al.
2009-08-20
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
Grant 7,459,705 - Nakasugi , et al. December 2, 2
2008-12-02
Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device
Grant 7,449,700 - Inanami November 11, 2
2008-11-11
Semiconductor Chip With Identification Codes, Manufacturing Method Of The Chip And Semiconductor Chip Management System
App 20080121709 - Hayashi; Hiroaki ;   et al.
2008-05-29
Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method
Grant 7,368,737 - Inanami , et al. May 6, 2
2008-05-06
Electron beam writing data creating method and electron beam writing data creating apparatus
App 20070281490 - Inanami; Ryoichi
2007-12-06
Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus
Grant 7,301,161 - Inanami November 27, 2
2007-11-27
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
App 20070114463 - Nakasugi; Tetsuro ;   et al.
2007-05-24
Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method
App 20060289797 - Inanami; Ryoichi ;   et al.
2006-12-28
Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device
App 20060243921 - Inanami; Ryoichi
2006-11-02
Charged particle beam exposure method and method for producing charged particle beam exposure data
Grant 7,102,147 - Inanami , et al. September 5, 2
2006-09-05
Method and system for producing semiconductor devices
Grant 7,079,994 - Inanami , et al. July 18, 2
2006-07-18
Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus
App 20050208772 - Inanami, Ryoichi
2005-09-22
Method of preparing exposure data and method of preparing aperture mask data
Grant 6,756,159 - Inanami June 29, 2
2004-06-29
Charged particle beam exposure system using aperture mask in semiconductor manufacture
Grant 6,718,532 - Inanami , et al. April 6, 2
2004-04-06
Charged particle beam exposure method and method for producing charged particle beam exposure data
App 20030160192 - Inanami, Ryoichi ;   et al.
2003-08-28
Circuit pattern design method, exposure method, charged-particle beam exposure system
Grant 6,481,004 - Inanami , et al. November 12, 2
2002-11-12
Charged particle beam exposure system using aperture mask in semiconductor manufacture
App 20020162088 - Inanami, Ryoichi ;   et al.
2002-10-31
Manufacturing method of semiconductor device, exposure data preparing method, preparing method of aperture mask data, and charge beam exposure apparatus
App 20020142238 - Inanami, Ryoichi
2002-10-03
Method and system for producing semiconductor devices
App 20020013930 - Inanami, Ryoichi ;   et al.
2002-01-31
Circuit pattern design method, circuit pattern design system, and recording medium
App 20020010905 - Inanami, Ryoichi ;   et al.
2002-01-24
Circuit pattern design method,exposure method, charged-particle beam exposure system
App 20020010906 - Inanami, Ryoichi ;   et al.
2002-01-24
Method of extracting characters and computer-readable recording medium
App 20010037487 - Inanami, Ryoichi ;   et al.
2001-11-01
Exposure pattern data generation apparatus associated with standard cell library and charged beam exposure
App 20010028991 - Inanami, Ryoichi ;   et al.
2001-10-11

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