| Patent | Date |
|---|
Semiconductor structure formation
Grant 11,404,267 - Sarkar , et al. August 2, 2 | 2022-08-02 |
Semiconductor contact formation
Grant 11,393,688 - Imonigie , et al. July 19, 2 | 2022-07-19 |
Methods for selectively removing more-doped-silicon-dioxide relative to less-doped-silicon-dioxide
Grant 11,361,972 - Imonigie , et al. June 14, 2 | 2022-06-14 |
Integrated Assemblies and Methods of Forming Integrated Assemblies
App 20220059693 - Nakamura; Yoshitaka ; et al. | 2022-02-24 |
Semiconductor Contact Formation
App 20220045195 - Imonigie; Jerome A. ; et al. | 2022-02-10 |
Semiconductor processing applying supercritical drying
Grant 11,127,588 - Korkmaz , et al. September 21, 2 | 2021-09-21 |
Semiconductor Structure Formation
App 20210202246 - Sarkar; Santanu ; et al. | 2021-07-01 |
Using Sacrificial Polymer Materials In Semiconductor Processing
App 20210159069 - Andreas; Michael T. ; et al. | 2021-05-27 |
Semiconductor recess formation
Grant 10,978,306 - Imonigie , et al. April 13, 2 | 2021-04-13 |
Using sacrificial polymer materials in semiconductor processing
Grant 10,916,418 - Andreas , et al. February 9, 2 | 2021-02-09 |
Methods for Selectively Removing More-Doped-Silicon-Dioxide relative to Less-Doped-Silicon-Dioxide
App 20200335351 - Imonigie; Jerome A. ; et al. | 2020-10-22 |
Semiconductor Processing
App 20200328076 - Korkmaz; Sevim ; et al. | 2020-10-15 |
Semiconductor Recess Formation
App 20200312954 - Imonigie; Jerome A. ; et al. | 2020-10-01 |
Semiconductor structure formation
Grant 10,777,561 - Shreeram , et al. Sept | 2020-09-15 |
Semiconductor Structure Formation
App 20200243528 - Shreeram; Devesh Dadhich ; et al. | 2020-07-30 |
Using Sacrificial Polymer Materials In Semiconductor Processing
App 20200075316 - Andreas; Michael T. ; et al. | 2020-03-05 |
Using sacrificial polymer materials in semiconductor processing
Grant 10,497,558 - Andreas , et al. De | 2019-12-03 |
Removing polysilicon
Grant 10,479,938 - Imonigie , et al. Nov | 2019-11-19 |
Using Sacrificial Polymer Materials In Semiconductor Processing
App 20190267232 - Andreas; Michael T. ; et al. | 2019-08-29 |
Removing polysilicon
Grant 10,113,113 - Imonigie , et al. October 30, 2 | 2018-10-30 |
Removing Polysilicon
App 20180298282 - Imonigie; Jerome A. ; et al. | 2018-10-18 |
Removing Polysilicon
App 20170243758 - Imonigie; Jerome A. ; et al. | 2017-08-24 |
Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures
Grant 9,653,307 - Imonigie , et al. May 16, 2 | 2017-05-16 |
Compositions for etching polysilicon
Grant 9,650,570 - Imonigie , et al. May 16, 2 | 2017-05-16 |
Methods of selectively doping chalcogenide materials and methods of forming semiconductor devices
Grant 9,614,153 - Imonigie , et al. April 4, 2 | 2017-04-04 |
Compositions for removing residues and related methods
Grant 9,593,297 - Franklin , et al. March 14, 2 | 2017-03-14 |
Compositions For Removing Residues And Related Methods
App 20160108348 - Franklin; Cole S. ; et al. | 2016-04-21 |
Compositions For Etching Polysilicon
App 20150203754 - Imonigie; Jerome A. ; et al. | 2015-07-23 |
Methods Of Selectively Doping Chalcogenide Materials And Methods Of Forming Semiconductor Devices
App 20150140777 - Imonigie; Jerome A. ; et al. | 2015-05-21 |
Etching polysilicon
Grant 9,012,318 - Imonigie , et al. April 21, 2 | 2015-04-21 |
Methods of selectively forming metal-doped chalcogenide materials, methods of selectively doping chalcogenide materials, and methods of forming semiconductor device structures including same
Grant 8,962,460 - Imonigie , et al. February 24, 2 | 2015-02-24 |
Etching Polysilicon
App 20140087551 - IMONIGIE; Jerome A. ; et al. | 2014-03-27 |
Recessed Gate Memory Apparatuses And Methods
App 20130334594 - Imonigie; Jerome A. ; et al. | 2013-12-19 |
Methods Of Selectively Forming Metal-doped Chalcogenide Materials, Methods Of Selectively Doping Chalcogenide Materials, And Methods Of Forming Semiconductor Device Structures Including Same
App 20120276725 - Imonigie; Jerome A. ; et al. | 2012-11-01 |
| 