loadpatents
name:-0.019551992416382
name:-0.012143850326538
name:-0.0050761699676514
IMAI; Masayoshi Patent Filings

IMAI; Masayoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for IMAI; Masayoshi.The latest application filed is for "cleaning apparatus for cleaning member, substrate cleaning apparatus and cleaning member assembly".

Company Profile
4.10.14
  • IMAI; Masayoshi - Tokyo JP
  • Imai; Masayoshi - Kyoto JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Cleaning Apparatus For Cleaning Member, Substrate Cleaning Apparatus And Cleaning Member Assembly
App 20210305069 - KAJIKAWA; Takayuki ;   et al.
2021-09-30
Substrate cleaning apparatus, substrate cleaning method, and control method of substrate cleaning apparatus
Grant 10,985,037 - Minoshima , et al. April 20, 2
2021-04-20
Method Of Cleaning A Substrate
App 20200176281 - MAEDA; Koji ;   et al.
2020-06-04
Substrate cleaning apparatus
Grant 10,607,862 - Imai
2020-03-31
Substrate processing apparatus and substrate processing method
Grant 10,500,691 - Imai , et al. Dec
2019-12-10
Substrate processing apparatus and pipe cleaning method for substrate processing apparatus
Grant 10,438,818 - Kunisawa , et al. O
2019-10-08
Wafer drying apparatus and wafer drying method
Grant 10,229,841 - Imai , et al.
2019-03-12
Substrate Cleaning Apparatus, Substrate Cleaning Method, And Control Method Of Substrate Cleaning Apparatus
App 20180294171 - MINOSHIMA; Daisuke ;   et al.
2018-10-11
Substrate Processing Apparatus And Substrate Processing Method
App 20180056470 - IMAI; Masayoshi ;   et al.
2018-03-01
Substrate Cleaning Apparatus
App 20170263471 - IMAI; Masayoshi
2017-09-14
Substrate cleaning apparatus
Grant 9,666,455 - Imai May 30, 2
2017-05-30
Substrate Processing Apparatus And Pipe Cleaning Method For Substrate Processing Apparatus
App 20170117165 - KUNISAWA; Junji ;   et al.
2017-04-27
Wafer Drying Apparatus And Wafer Drying Method
App 20160372344 - IMAI; Masayoshi ;   et al.
2016-12-22
Substrate Cleaning Apparatus And Polishing Apparatus
App 20140190633 - Maeda; Koji ;   et al.
2014-07-10
Substrate Cleaning Apparatus
App 20130306116 - Imai; Masayoshi
2013-11-21
Substrate processing apparatus
Grant 7,479,205 - Okuda , et al. January 20, 2
2009-01-20
Substrate processing apparatus
Grant 7,428,907 - Okuda , et al. September 30, 2
2008-09-30
Substrate processing apparatus
Grant 7,267,130 - Okuda , et al. September 11, 2
2007-09-11
Substrate processing apparatus
Grant 6,951,221 - Okuda , et al. October 4, 2
2005-10-04
Substrate processing apparatus
App 20040206379 - Okuda, Seiichiro ;   et al.
2004-10-21
Substrate processing apparatus
App 20040206378 - Okuda, Seiichiro ;   et al.
2004-10-21
Substrate processing apparatus
App 20040206452 - Okuda, Seiichiro ;   et al.
2004-10-21
Substrate processing apparatus
App 20040200513 - Okuda, Seiichiro ;   et al.
2004-10-14
Substrate processing apparatus
App 20020035762 - Okuda, Seiichiro ;   et al.
2002-03-28

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