Imafuku; Kosuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Imafuku; Kosuke.The latest application filed is for "silicon focus ring".

Company Profile

0.15.13

Imafuku; Kosuke - Nirasaki JP
Imafuku; Kosuke - Nirasaki City JP
Imafuku; Kosuke - Yamanashi N/A JP
Imafuku; Kosuke - Nirasaki-shi JP
Imafuku; Kosuke - Kofu JP
Imafuku, Kosuke - Kofu-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Silicon focus ring Grant 9,399,584 - Imafuku July 26, 2	2016-07-26
Silicon Focus Ring App 20160152479 - Imafuku; Kosuke	2016-06-02
Silicon component for plasma etching apparatus Grant 9,290,391 - Imafuku March 22, 2	2016-03-22
Method of refurbishing a quartz glass component Grant 8,991,214 - Hoshino , et al. March 31, 2	2015-03-31
Silicon Component For Plasma Etching Apparatus App 20140294712 - Imafuku; Kosuke	2014-10-02
Method of recycling silicon component for plasma etching apparatus and silicon component for plasma etching apparatus Grant 8,785,214 - Imafuku July 22, 2	2014-07-22
Method Of Recycling Silicon Component For Plasma Etching Apparatus And Silicon Component For Plasma Etching Apparatus App 20110076221 - Imafuku; Kosuke	2011-03-31
Method Of Refurbishing A Quartz Glass Component App 20110023543 - Umetsu; Yasuhiro ; et al.	2011-02-03
Plasma Processing Apparatus And Electrode Plate, Electrode Supporting Body, And Shield Ring Thereof App 20080156441 - Ogasawara; Masahiro ; et al.	2008-07-03
Method and system for removal of gas and plasma processing apparatus Grant 7,207,340 - Imafuku , et al. April 24, 2	2007-04-24
Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon App 20040200804 - Sugiyama, Norikazu ; et al.	2004-10-14
Vacuum processing device App 20040083970 - Imafuku, Kosuke ; et al.	2004-05-06
Method for regenerating container for plasma treatment, member inside container for plasma treatment, method for preparing member inside container for plasma treatment, and apparatus for plasma treatment App 20040081746 - Imafuku, Kosuke	2004-04-29
Worktable device and plasma processing apparatus for semiconductor process Grant 6,723,202 - Nagaiwa , et al. April 20, 2	2004-04-20
Gas removal method, gas removal system and plasma processing apparatus App 20040043721 - Imafuku, Kosuke ; et al.	2004-03-04
Plasma processing apparatus, and electrode plate, electrode supporting body, and shield ringthereof App 20030155078 - Ogasawara, Masahiro ; et al.	2003-08-21
Plasma treatment method and apparatus Grant 6,544,380 - Tomoyasu , et al. April 8, 2	2003-04-08
Plasma treatment method and apparatus App 20020088547 - Tomoyasu, Masayuki ; et al.	2002-07-11
Worktable device and plasma processing apparatus for semiconductor process App 20020029745 - Nagaiwa, Toshifumi ; et al.	2002-03-14
Plasma treatment method and apparatus App 20010013504 - Imafuku, Kosuke ; et al.	2001-08-16
Plasma treatment method and apparatus Grant 6,264,788 - Tomoyasu , et al. July 24, 2	2001-07-24
Plasma treatment method utilizing an amplitude-modulated high frequency power Grant 6,106,737 - Tomoyasu , et al. August 22, 2	2000-08-22
Plasma processing apparatus Grant 6,074,518 - Imafuku , et al. June 13, 2	2000-06-13
Gas diffusion plate for electrode of semiconductor wafer processing apparatus Grant D411,516 - Imafuku , et al. June 29, 1	1999-06-29
Plasma processing method and plasma etching method Grant 5,716,534 - Tsuchiya , et al. February 10, 1	1998-02-10
Plasma treatment apparatus and method Grant 5,698,062 - Sakamoto , et al. December 16, 1	1997-12-16

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