loadpatents
name:-0.035183906555176
name:-0.043519020080566
name:-0.00046491622924805
Ikuta; Yoshiaki Patent Filings

Ikuta; Yoshiaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ikuta; Yoshiaki.The latest application filed is for "reflective mask blank for euv lithography".

Company Profile
0.44.41
  • Ikuta; Yoshiaki - Chiyoda-ku JP
  • IKUTA; Yoshiaki - Tokyo JP
  • Ikuta; Yoshiaki - Kumamoto JP
  • Ikuta; Yoshiaki - Yokohama N/A JP
  • Ikuta; Yoshiaki - Hyogo-Ken JP
  • Ikuta; Yoshiaki - Schenectady NY
  • Ikuta; Yoshiaki - Guilderland NY
  • Ikuta; Yoshiaki - Himeji JP
  • Ikuta; Yoshiaki - Kanagawa JP
  • Ikuta; Yoshiaki - Yokohama-shi JP
  • Ikuta, Yoshiaki - Fukushima JP
  • Ikuta, Yoshiaki - Himeji-Shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Reflective mask blank for EUV lithography
Grant 10,928,721 - Ikuta February 23, 2
2021-02-23
Reflective mask blank for EUV lithography, and process for its inspection and process for its production
Grant 9,739,722 - Nakanishi , et al. August 22, 2
2017-08-22
Reflective Mask Blank For Euv Lithography
App 20160357100 - IKUTA; Yoshiaki
2016-12-08
Glass Substrate For Mask Blank
App 20160266482 - UMEO; Naohiro ;   et al.
2016-09-15
Method Of Finishing Pre-polished Glass Substrate Surface
App 20160168020 - OKAMURA; Yuzo ;   et al.
2016-06-16
Reflective Mask Blank For Euv Lithography, And Process For Its Inspection And Process For Its Production
App 20160109384 - NAKANISHI; Hiroshi ;   et al.
2016-04-21
Reflective mask blank for EUV lithography, method of manufacturing thereof, reflective mask for EUV lithography and method of manufacturing thereof
Grant 9,268,207 - Ikuta February 23, 2
2016-02-23
Glass Substrate For Optical Lithography
App 20160041463 - Ikuta; Yoshiaki ;   et al.
2016-02-11
SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same
Grant 9,120,842 - Nishimura , et al. September 1, 2
2015-09-01
Reflective Mask Blank For Euv Lithography, Method Of Manufacturing Thereof, Reflective Mask For Euv Lithography And Method Of Manufacturing Thereof
App 20150198874 - IKUTA; Yoshiaki
2015-07-16
Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate
Grant 8,993,201 - Mikami , et al. March 31, 2
2015-03-31
Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate
Grant 8,921,017 - Okamura , et al. December 30, 2
2014-12-30
Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank
Grant 8,916,316 - Okamura , et al. December 23, 2
2014-12-23
Reflecting Mask Blank, Method For Manufacturing Reflective Mask Blank And Method For Quality Control For Reflective Mask Blank
App 20140186753 - OKAMURA; Yuzo ;   et al.
2014-07-03
Multilayer Substrate, Manufacturing Method For Multilayer Substrate, And Quality Control Method For Multilayer Substrate
App 20140011123 - OKAMURA; Yuzo ;   et al.
2014-01-09
Multilayer mirror for EUV lithography and process for its production
Grant 8,580,465 - Mikami , et al. November 12, 2
2013-11-12
Sparc-derived Tumor Rejection Antigenic Peptides And Medicaments Comprising The Same
App 20130288363 - NISHIMURA; Yasuharu ;   et al.
2013-10-31
Optical member base material for EUV lithography, and method for producing same
Grant 8,518,613 - Nakanishi , et al. August 27, 2
2013-08-27
SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same
Grant 8,470,968 - Nishimura , et al. June 25, 2
2013-06-25
Synthetic silica glass optical component and process for its production
Grant 8,402,786 - Ikuta , et al. March 26, 2
2013-03-26
Optical Member Base Material For Euv Lithography, And Method For Producing Same
App 20130011773 - NAKANISHI; Hiroshi ;   et al.
2013-01-10
Reflective Layer-equipped Substrate For Euv Lithography, Reflective Mask Blank For Euv Lithography, Reflective Mask For Euv Lithography, And Process For Production Of The Reflective Layer-equipped Substrate
App 20120231378 - Mikami; Masaki ;   et al.
2012-09-13
Banknote deposit machine, processing system and method
Grant 8,251,197 - Takeuchi , et al. August 28, 2
2012-08-28
Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithography
Grant 8,241,821 - Ikuta August 14, 2
2012-08-14
Multilayer Mirror For Euv Lithography And Process For Its Production
App 20120196208 - MIKAMI; Masaki ;   et al.
2012-08-02
Method and apparatus for an in-situ ultraviolet cleaning tool
Grant 8,206,510 - Rastegar , et al. June 26, 2
2012-06-26
Sparc-derived Tumor Rejection Antigenic Peptides And Medicaments Comprising The Same
App 20120115221 - NISHIMURA; Yasuharu ;   et al.
2012-05-10
Method for removing foreign matter from substrate surface
Grant 8,052,797 - Ikuta November 8, 2
2011-11-08
SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same
Grant 8,053,557 - Nishimura , et al. November 8, 2
2011-11-08
Diagnostic kit for malignant melanoma
Grant 8,017,345 - Nishimura , et al. September 13, 2
2011-09-13
Reflective Mask Blank For Euv Lithography, Process For Producing The Same And Mask For Euv Lithography
App 20110165504 - IKUTA; Yoshiaki
2011-07-07
Reflective-type mask blank for EUV lithography
Grant 7,960,077 - Ikuta , et al. June 14, 2
2011-06-14
Method and Apparatus for an In-Situ Ultraviolet Cleaning Tool
App 20110132394 - Rastegar; Abbas ;   et al.
2011-06-09
Tio2-containing Quartz Glass Substrate
App 20110089612 - IKUTA; YOSHIAKI ;   et al.
2011-04-21
Method and apparatus for an in-situ ultraviolet cleaning tool
Grant 7,921,859 - Rastegar , et al. April 12, 2
2011-04-12
Process for smoothing surface of glass substrate
Grant 7,901,843 - Sugiyama , et al. March 8, 2
2011-03-08
TiO2-containing quartz glass substrate
App 20100234205 - Ikuta; Yoshiaki ;   et al.
2010-09-16
Optical member made of synthetic quartz glass, and process for its production
Grant 7,784,307 - Ogawa , et al. August 31, 2
2010-08-31
Banknote Deposit Machine, Processing System And Method
App 20100174403 - TAKEUCHI; HISASHI ;   et al.
2010-07-08
Reflective-type Mask Blank For Euv Lithography
App 20100167187 - IKUTA; Yoshiaki ;   et al.
2010-07-01
Sparc-derived Tumor Rejection Antigenic Peptides And Medicaments Comprising The Same
App 20100152421 - Nishimura; Yasuharu ;   et al.
2010-06-17
Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography
Grant 7,712,333 - Uno , et al. May 11, 2
2010-05-11
Printed note processing machine and system
Grant 7,694,797 - Takeuchi , et al. April 13, 2
2010-04-13
Reflective-type mask blank for EUV lithography
Grant 7,678,511 - Ikuta , et al. March 16, 2
2010-03-16
Process For Smoothing Surface Of Glass Substrate
App 20090286166 - SUGIYAMA; Takashi ;   et al.
2009-11-19
Quartz glass substrate and process for its production
Grant 7,592,063 - Ikuta , et al. September 22, 2
2009-09-22
Photomask, photomask manufacturing method, and photomask processing device
Grant 7,549,141 - Ikuta , et al. June 16, 2
2009-06-16
Apparatus and method for cleaning substrate
Grant 7,527,695 - Ikuta May 5, 2
2009-05-05
Novel Diagnostic Kit For Malignant Melanoma
App 20090111095 - Nishimura; Yasuharu ;   et al.
2009-04-30
Synthetic quartz glass for optical member and its production method
Grant 7,514,382 - Ikuta , et al. April 7, 2
2009-04-07
Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography
Grant 7,504,185 - Ikuta , et al. March 17, 2
2009-03-17
Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
Grant 7,368,403 - Ikuta , et al. May 6, 2
2008-05-06
Method For Removing Foreign Matter From Substrate Surface
App 20080092918 - IKUTA; Yoshiaki
2008-04-24
Quartz glass substrate and process for its production
App 20080057291 - Ikuta; Yoshiaki ;   et al.
2008-03-06
Apparatus and method for cleaning substrate
App 20070295355 - Ikuta; Yoshiaki
2007-12-27
Method for removing contaminant from surface of glass substrate
App 20070256703 - Ikuta; Yoshiaki
2007-11-08
Method for smoothing a surface of a glass substrate, and substrate for a reflective mask blank used in EUV lithography, obtainable by that method
App 20070240453 - Uno; Toshiyuki ;   et al.
2007-10-18
Reflective-type mask blank for EUV lithography
App 20070160916 - Ikuta; Yoshiaki ;   et al.
2007-07-12
Defect repair device and defect repair method
Grant 7,230,695 - Ikuta , et al. June 12, 2
2007-06-12
Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography
App 20070077499 - Ikuta; Yoshiaki ;   et al.
2007-04-05
Photomask, photomask manufacturing method, and photomask processing device
App 20070059608 - Ikuta; Yoshiaki ;   et al.
2007-03-15
Optical member made of synthetic quartz glass, and process for its production
App 20070027018 - Ogawa; Tomonori ;   et al.
2007-02-01
Method and apparatus for an in-situ ultraviolet cleaning tool
App 20060207629 - Rastegar; Abbas ;   et al.
2006-09-21
Synthetic quartz glass for optical member and its production method
App 20060183623 - Ikuta; Yoshiaki ;   et al.
2006-08-17
Synthetic quartz glass and process for producing it
Grant 7,022,633 - Ikuta , et al. April 4, 2
2006-04-04
Defect repair device and defect repair method
App 20060007433 - Ikuta; Yoshiaki ;   et al.
2006-01-12
Synthetic quartz glass
App 20050176572 - Hosono, Hideo ;   et al.
2005-08-11
Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
App 20050068644 - Ikuta, Yoshiaki ;   et al.
2005-03-31
Printed note processing machine and system
App 20040205025 - Takeuchi, Hisashi ;   et al.
2004-10-14
Bill handling machine
Grant 6,749,053 - Ikuta June 15, 2
2004-06-15
Synthetic quartz glass and process for producing it
App 20030195107 - Ikuta, Yoshiaki ;   et al.
2003-10-16
Exposure apparatus, semiconductor device, and photomask
Grant 6,611,317 - Ogawa , et al. August 26, 2
2003-08-26
Synthetic quartz glass and method for preparing the same
Grant 6,576,578 - Ikuta , et al. June 10, 2
2003-06-10
Synthetic quartz glass for optical member, process for producing the same, and method of using the same
Grant 6,544,914 - Kikugawa , et al. April 8, 2
2003-04-08
Synthetic silica glass optical component and process for its production
App 20030051507 - Ikuta, Yoshiaki ;   et al.
2003-03-20
Pellicle and method for manufacture thereof
Grant 6,475,575 - Ikuta , et al. November 5, 2
2002-11-05
Container for an optical article
App 20010035361 - Mishiro, Hitoshi ;   et al.
2001-11-01
Bill handling machine
App 20010015309 - Ikuta, Yoshiaki
2001-08-23
Method for drawing up special crude oil
Grant 4,919,207 - Ikuta , et al. April 24, 1
1990-04-24
Method for drawing up special crude oil
Grant 4,756,368 - Ikuta , et al. July 12, 1
1988-07-12

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