Ikezawa; Hironori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ikezawa; Hironori.The latest application filed is for "projection optical assembly, projection optical assembly adjustment method, exposure device, exposure method, and device manufacturing method".

Company Profile

0.13.14

Ikezawa; Hironori - Fukaya-shi JP
Ikezawa; Hironori - Fukaya JP
Ikezawa; Hironori - Saitama-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Projection Optical Assembly, Projection Optical Assembly Adjustment Method, Exposure Device, Exposure Method, And Device Manufacturing Method App 20130278910 - Ikezawa; Hironori ; et al.	2013-10-24
Projection optical system, exposure system, and exposure method Grant 7,978,310 - Ikezawa , et al. July 12, 2	2011-07-12
Projection Optical System, Exposure System, And Exposure Method App 20100159401 - IKEZAWA; Hironori ; et al.	2010-06-24
Projection optical system, exposure system, and exposure method Grant 7,710,653 - Ikezawa , et al. May 4, 2	2010-05-04
Projection optical system and method for photolithography and exposure apparatus and method using same Grant 7,701,640 - Omura , et al. April 20, 2	2010-04-20
Projection optical system, exposure system, and exposure method Grant 7,688,422 - Ikezawa , et al. March 30, 2	2010-03-30
Projection optical system and method for photolithography and exposure apparatus and method using same Grant 7,688,517 - Omura , et al. March 30, 2	2010-03-30
Projection optical system and method for photolithography and exposure apparatus and method using same Grant 7,619,827 - Omura , et al. November 17, 2	2009-11-17
Projection optical system and method for photolithography and exposure apparatus and method using same Grant 7,609,455 - Omura , et al. October 27, 2	2009-10-27
Projection optical system and method for photolithography and exposure apparatus and method using same Grant 7,580,197 - Omura , et al. August 25, 2	2009-08-25
Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element Grant 7,557,997 - Omura , et al. July 7, 2	2009-07-07
Projection optical system and method for photolithography and exposure apparatus and method using same Grant 7,551,362 - Omura , et al. June 23, 2	2009-06-23
Projection optical system, exposure apparatus, and exposure method Grant 7,471,374 - Omura , et al. December 30, 2	2008-12-30
Projection optical system and method for photolithography and exposure apparatus and method using same App 20080094696 - Omura; Yasuhiro ; et al.	2008-04-24
Projection optical system and method for photolithography and exposure apparatus and method using same Grant 7,362,508 - Omura , et al. April 22, 2	2008-04-22
Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element App 20080080067 - Omura; Yasuhiro ; et al.	2008-04-03
Projection optical system and method for photolithography and exposure apparatus and method using same App 20080068573 - Omura; Yasuhiro ; et al.	2008-03-20
Projection optical system and method for photolithography and exposure apparatus and method using same App 20080068576 - Omura; Yasuhiro ; et al.	2008-03-20
Projection optical system and method for photolithography and exposure apparatus and method using same App 20080068724 - Omura; Yasuhiro ; et al.	2008-03-20
Projection optical system and method for photolithography and exposure apparatus and method using same App 20080049306 - Omura; Yasuhiro ; et al.	2008-02-28
Projection optical system and method for photolithography and exposure apparatus and method using same App 20080049336 - Omura; Yasuhiro ; et al.	2008-02-28
Projection Optical System, Exposure System, And Exposure Method App 20070285633 - Ikezawa; Hironori ; et al.	2007-12-13
Projection optical system, exposure system, and exposure method App 20070188879 - Ikezawa; Hironori ; et al.	2007-08-16
Projection optical system, exposure apparatus, and exposure method App 20060087633 - Omura; Yasuhiro ; et al.	2006-04-27
Projection optical system and method for photolithography and exposure apparatus and method using same App 20050248856 - Omura, Yasuhiro ; et al.	2005-11-10
Production method of projection optical system Grant 6,788,389 - Fujishima , et al. September 7, 2	2004-09-07
Production method of projection optical system App 20030053036 - Fujishima, Youhei ; et al.	2003-03-20

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