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Patent applications and USPTO patent grants for Ikedo; Yozo.The latest application filed is for "film-forming material mixed-gas forming device and film forming device".
Patent | Date |
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Film-forming Material Mixed-gas Forming Device And Film Forming Device App 20210054504 - Wang; Hua Feng ;   et al. | 2021-02-25 |
Film forming apparatus Grant 10,526,704 - Nonaka , et al. J | 2020-01-07 |
Susceptor Grant D864,134 - Watarai , et al. Oc | 2019-10-22 |
Substrate treatment apparatus Grant 10,435,789 - Tsuji , et al. O | 2019-10-08 |
Shower plate Grant D829,306 - Ikedo , et al. September 25, 2 | 2018-09-25 |
Substrate Treatment Apparatus App 20180158709 - TSUJI; Naoto ;   et al. | 2018-06-07 |
Film Forming Apparatus App 20160222513 - NONAKA; Yuya ;   et al. | 2016-08-04 |
Substrate-supporting device Grant 7,691,205 - Ikedo April 6, 2 | 2010-04-06 |
Substrate-supporting device App 20070089670 - Ikedo; Yozo | 2007-04-26 |
Method of forming fluorine-doped low-dielectric-constant insulating film Grant 7,037,855 - Tsuji , et al. May 2, 2 | 2006-05-02 |
Method Of Forming Fluorine-doped Low-dielectric-constant Insulating Film App 20060046519 - Tsuji; Naoto ;   et al. | 2006-03-02 |
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