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Plasma processing apparatus
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Plasma processing apparatus and plasma processing method
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Plasma processing apparatus and method
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Plasma processing apparatus and plasma processing method
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Plasma processing apparatus, plasma processing method, and ECR height monitor
Grant 11,081,320 - Ikeda , et al. August 3, 2 | 2021-08-03 |
Plasma Processing Apparatus
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Plasma Processing Apparatus, Plasma Processing Method, And Ecr Height Monitor
App 20200286715 - IKEDA; Norihiko ; et al. | 2020-09-10 |
Plasma Processing Apparatus And Plasma Processing Method
App 20200279719 - YAMADA; Kazuya ; et al. | 2020-09-03 |
Plasma processing apparatus and plasma processing method
Grant 10,755,897 - Ikeda , et al. A | 2020-08-25 |
Plasma processing apparatus and plasma processing method
Grant 10,699,884 - Yamada , et al. | 2020-06-30 |
Plasma Processing Apparatus And Plasma Processing Method
App 20190237300 - Ikeda; Norihiko ; et al. | 2019-08-01 |
Plasma Processing Apparatus And Method
App 20190115193 - Yasui; Naoki ; et al. | 2019-04-18 |
Plasma Processing Apparatus And Plasma Processing Method
App 20190088452 - YAMADA; Kazuya ; et al. | 2019-03-21 |
Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method
Grant 10,088,750 - Namai , et al. October 2, 2 | 2018-10-02 |
Plasma Processing Apparatus And Plasma Processing Method
App 20180082821 - IKEDA; Norihiko ; et al. | 2018-03-22 |
Photoresist composition, compound, and production method thereof
Grant 9,720,322 - Namai , et al. August 1, 2 | 2017-08-01 |
Acid Diffusion Control Agent, Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Compound, And Production Method
App 20170131632 - NAMAI; Hayato ; et al. | 2017-05-11 |
Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method
Grant 9,588,423 - Namai , et al. March 7, 2 | 2017-03-07 |
Photoresist Composition, Compound, And Production Method Thereof
App 20160370700 - NAMAI; Hayato ; et al. | 2016-12-22 |
Photoresist composition, compound, and production method thereof
Grant 9,477,149 - Namai , et al. October 25, 2 | 2016-10-25 |
Radiation-sensitive resin composition, polymer and compound
Grant 9,459,532 - Ikeda , et al. October 4, 2 | 2016-10-04 |
Sample processing apparatus, sample processing system, and method for processing sample
Grant 9,390,941 - Watanabe , et al. July 12, 2 | 2016-07-12 |
Photoresist composition and resist pattern-forming method
Grant 9,329,474 - Kasahara , et al. May 3, 2 | 2016-05-03 |
Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base
Grant 9,323,146 - Namai , et al. April 26, 2 | 2016-04-26 |
Acid Diffusion Control Agent, Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Compound, And Production Method
App 20150079520 - NAMAI; Hayato ; et al. | 2015-03-19 |
Photoresist Composition, Compound, And Production Method Thereof
App 20150004545 - NAMAI; Hayato ; et al. | 2015-01-01 |
Photoresist Composition, Resist Pattern-forming Method, Compound, Acid Generating Agent, And Photodegradable Base
App 20140363769 - NAMAI; Hayato ; et al. | 2014-12-11 |
Plasma Processing Apparatus And Method
App 20140011365 - YASUI; Naoki ; et al. | 2014-01-09 |
Photoresist Composition And Resist Pattern-forming Method
App 20130280657 - KASAHARA; Kazuki ; et al. | 2013-10-24 |
Radiation-sensitive Resin Composition, Polymer And Compound
App 20130216951 - IKEDA; Norihiko ; et al. | 2013-08-22 |
Sample Processing Device, Sample Processing System, And Method For Processing Sample
App 20120228261 - Watanabe; Seiichi ; et al. | 2012-09-13 |
Polymer and positive-tone radiation-sensitive resin composition
Grant 8,182,977 - Ikeda , et al. May 22, 2 | 2012-05-22 |
Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion
Grant 8,157,877 - Ikeda , et al. April 17, 2 | 2012-04-17 |
Radiation-sensitive Resin Composition And Polymer
App 20110223537 - Ebata; Takuma ; et al. | 2011-09-15 |
Polymer And Positive-tone Radiation-sensitive Resin Composition
App 20100239981 - IKEDA; Norihiko ; et al. | 2010-09-23 |
Aqueous Dispersion For Chemical Mechanical Polishing, Production Method Thereof, And Chemical Mechanical Polishing Method
App 20090325323 - Ueno; Tomikazu ; et al. | 2009-12-31 |
Chemical Mechanical Polishing Aqueous Dispersion, Chemical Mechanical Polishing Method, And Kit For Preparing Chemical Mechanical Polishing Aqueous Dispersion
App 20090165395 - Ikeda; Norihiko ; et al. | 2009-07-02 |
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
Grant 7,550,020 - Ikeda , et al. June 23, 2 | 2009-06-23 |
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
Grant 7,252,782 - Ikeda , et al. August 7, 2 | 2007-08-07 |
Stopper For Chemical Mechanical Planarization, Method For Manufacturing Same, And Chemical Mechanical Planarization Method
App 20070151951 - Yoshioka; Mutsuhiko ; et al. | 2007-07-05 |
Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization method
Grant 7,189,651 - Yoshioka , et al. March 13, 2 | 2007-03-13 |
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
App 20060010781 - Ikeda; Norihiko ; et al. | 2006-01-19 |
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
App 20050164510 - Ikeda, Norihiko ; et al. | 2005-07-28 |
Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization method
App 20040110379 - Yoshioka, Mutsuhiko ; et al. | 2004-06-10 |
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