Iizuka; Naoto
Patent Applications and Registrations
Patent applications and USPTO patent grants for Iizuka; Naoto.The latest application filed is for "final polishing method for silicon single crystal wafer and silicon single crystal wafer".
- Iizuka; Naoto - Chiyoda JP
- Iizuka, Naoto - Fukushima JP
- Iizuka; Naoto - Vancouver WA
| Patent | Date |
|---|---|
| Final polishing method for silicon single crystal wafer and silicon single crystal wafer Grant 8,569,148 - Iizuka , et al. October 29, 2 | 2013-10-29 |
| Final Polishing Method For Silicon Single Crystal Wafer And Silicon Single Crystal Wafer App 20100090314 - Iizuka; Naoto ; et al. | 2010-04-15 |
| Production method for silicon wafer and silicon wafer and soi wafer App 20040072437 - Iizuka, Naoto ; et al. | 2004-04-15 |
| Contamination monitoring system Grant 6,058,947 - Bennett , et al. May 9, 2 | 2000-05-09 |
| Method of monitoring fluid contamination Grant 5,849,103 - Bennett , et al. December 15, 1 | 1998-12-15 |
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