Iizuka; Hachishiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Iizuka; Hachishiro.The latest application filed is for "plasma processing apparatus and electrode structure".
Company Profile
1.35.42
- Iizuka; Hachishiro - Nirasaki JP
- IIZUKA; Hachishiro - Yamanashi JP
- IIZUKA; Hachishiro - Nirasaki-shi Yamanashi
- IIZUKA; Hachishiro - Nirasaki City JP
- Iizuka; Hachishiro - Amagasaki JP
- Iizuka; Hachishiro - Hyogo JP
- Iizuka; Hachishiro - Amagasaki-shi JP
- Iizuka, Hachishiro - Yamanashi-Ken JP
- Iizuka, Hachishiro - Tokyo JP
Patent Activity
| Patent | Date |
|---|---|
| Film forming apparatus Grant 11,414,754 - Iizuka August 16, 2 | 2022-08-16 |
| Plasma Processing Apparatus And Electrode Structure App 20220084798 - IIZUKA; Hachishiro ; et al. | 2022-03-17 |
| Film Forming Apparatus App 20210301398 - IIZUKA; Hachishiro | 2021-09-30 |
| Plasma Processing Apparatus App 20210233750 - IIZUKA; Hachishiro | 2021-07-29 |
| Upper Electrode And Plasma Processing Apparatus App 20210142989 - IIZUKA; Hachishiro | 2021-05-13 |
| Substrate Processing Apparatus And Shower Head App 20210079526 - IIZUKA; Hachishiro | 2021-03-18 |
| Sealing Structure, Vacuum Processing Apparatus And Sealing Method App 20210005482 - IIZUKA; Hachishiro ; et al. | 2021-01-07 |
| Plasma processing apparatus Grant 9,807,862 - Iizuka October 31, 2 | 2017-10-31 |
| Substrate Mounting Mechanism And Substrate Processing Apparatus App 20170133245 - IIZUKA; Hachishiro | 2017-05-11 |
| Plasma processing apparatus Grant 9,196,461 - Iizuka November 24, 2 | 2015-11-24 |
| Plasma processing apparatus and processing gas supply structure thereof Grant 9,117,633 - Iizuka August 25, 2 | 2015-08-25 |
| Plasma processing apparatus Grant 8,986,495 - Iizuka March 24, 2 | 2015-03-24 |
| Plasma processing apparatus and shower head Grant 8,852,387 - Iizuka , et al. October 7, 2 | 2014-10-07 |
| Plasma processing apparatus Grant 8,852,386 - Iizuka , et al. October 7, 2 | 2014-10-07 |
| Film forming apparatus and vaporizer Grant 8,758,511 - Iizuka , et al. June 24, 2 | 2014-06-24 |
| Shower head and plasma processing apparatus having same Grant 8,758,550 - Iizuka June 24, 2 | 2014-06-24 |
| Plasma processing apparatus and shower head Grant 8,747,609 - Iizuka , et al. June 10, 2 | 2014-06-10 |
| Plasma processing apparatus and processing gas supply structure thereof Grant 8,674,607 - Iizuka March 18, 2 | 2014-03-18 |
| Plasma processing apparatus and plasma processing method Grant 8,608,903 - Yamazawa , et al. December 17, 2 | 2013-12-17 |
| Plasma Processing Apparatus App 20130264014 - IIZUKA; Hachishiro | 2013-10-10 |
| Shower head and substrate processing apparatus Grant 8,366,828 - Iizuka February 5, 2 | 2013-02-05 |
| Shower head and plasma processing apparatus having same Grant 8,282,769 - Iizuka October 9, 2 | 2012-10-09 |
| Shower head and substrate processing apparatus Grant 8,236,106 - Iizuka , et al. August 7, 2 | 2012-08-07 |
| Gas supply mechanism and substrate processing apparatus Grant 8,221,581 - Iizuka July 17, 2 | 2012-07-17 |
| Plasma Processing Apparatus App 20120111501 - IIZUKA; Hachishiro | 2012-05-10 |
| Plasma Processing Apparatus App 20120103523 - Iizuka; Hachishiro | 2012-05-03 |
| Plasma Processing Apparatus And Processing Gas Supply Structure Thereof App 20120090783 - Iizuka; Hachishiro | 2012-04-19 |
| Baffle plate and substrate processing apparatus Grant 8,152,925 - Iizuka April 10, 2 | 2012-04-10 |
| Plasma Processing Apparatus And Processing Gas Supply Structure Thereof App 20110291568 - Iizuka; Hachishiro | 2011-12-01 |
| Plasma Processing Apparatus App 20110284165 - IIZUKA; Hachishiro | 2011-11-24 |
| Coupling member and plasma processing apparatus Grant 8,052,364 - Iizuka , et al. November 8, 2 | 2011-11-08 |
| Plasma processing apparatus Grant 8,043,471 - Iizuka October 25, 2 | 2011-10-25 |
| Plasma Processing Apparatus And Shower Head App 20110214814 - Iizuka; Hachishiro ; et al. | 2011-09-08 |
| Plasma Processing Apparatus App 20110132542 - IIZUKA; Hachishiro | 2011-06-09 |
| Plasma Processing Apparatus And Plasma Processing Method App 20110094995 - Yamazawa; Yohei ; et al. | 2011-04-28 |
| Plasma Processing Apparatus And Shower Head App 20110067815 - Iizuka; Hachishiro ; et al. | 2011-03-24 |
| Plasma Processing Apparatus App 20110061813 - Iizuka; Hachishiro ; et al. | 2011-03-17 |
| Substrate Processing Apparatus App 20100307686 - Iizuka; Hachishiro ; et al. | 2010-12-09 |
| Shower Head And Plasma Processing Apparatus Having Same App 20100230052 - IIZUKA; Hachishiro | 2010-09-16 |
| Shower Head And Plasma Processing Apparatus Having Same App 20100230051 - IIZUKA; Hachishiro | 2010-09-16 |
| Vaporizer and semiconductor processing apparatus Grant 7,666,260 - Iizuka February 23, 2 | 2010-02-23 |
| Plasma Processing Unit App 20090314435 - IKEDA; Taro ; et al. | 2009-12-24 |
| Baffle Plate And Substrate Processing Apparatus App 20090314432 - IIZUKA; Hachishiro | 2009-12-24 |
| Substrate Processing Apparatus And Substrate Placing Table App 20090266300 - Iizuka; Hachishiro | 2009-10-29 |
| Coupling Member And Plasma Processing Apparatus App 20090245971 - Iizuka; Hachishiro ; et al. | 2009-10-01 |
| Shower Head And Substrate Processing Apparatus App 20090236041 - IIZUKA; Hachishiro | 2009-09-24 |
| Shower Head And Substrate Processing Apparatus App 20090229754 - IIZUKA; Hachishiro ; et al. | 2009-09-17 |
| Plasma processing apparatus and substrate mounting table employed therein Grant 7,513,954 - Iizuka , et al. April 7, 2 | 2009-04-07 |
| Substrate Treating Apparatus And Treating Gas Emitting Mechanism App 20090038548 - Iizuka; Hachishiro ; et al. | 2009-02-12 |
| Substrate Processing Apparatus And Shower Head App 20090000743 - IIZUKA; Hachishiro | 2009-01-01 |
| Gas Supply Mechanism And Substrate Processing Apparatus App 20080314523 - IIZUKA; Hachishiro | 2008-12-25 |
| Middle plate for the shower head Grant D581,012 - Iizuka , et al. November 18, 2 | 2008-11-18 |
| Gas reaction system and semiconductor processing apparatus Grant 7,413,611 - Iizuka August 19, 2 | 2008-08-19 |
| Film Forming Apparatus and Vaporizer App 20070266944 - Iizuka; Hachishiro ; et al. | 2007-11-22 |
| Liquid Amount Monitoring Apparatus, Semiconductor Manufacturing Apparatus Having the Liquid Amount Monitoring Apparatus Mounted Thereon, and Liquid Material/Liquid Amount Monitoring Method App 20070261735 - Yasumuro; Akira ; et al. | 2007-11-15 |
| Plasma Etching Apparatus App 20070227659 - Iizuka; Hachishiro | 2007-10-04 |
| Plasma Processing Apparatus App 20070227668 - Iizuka; Hachishiro | 2007-10-04 |
| Sheet-fed treating device Grant 7,232,502 - Iizuka June 19, 2 | 2007-06-19 |
| Vaporizer and semiconductor processing apparatus App 20070101940 - Iizuka; Hachishiro | 2007-05-10 |
| Gas Treating Device And Film Forming Device App 20070095284 - IIZUKA; Hachishiro ; et al. | 2007-05-03 |
| Gas treatment device and heat readiting method App 20070022954 - Iizuka; Hachishiro ; et al. | 2007-02-01 |
| Gas reaction system and semiconductor processing apparatus App 20060180078 - Iizuka; Hachishiro | 2006-08-17 |
| Treatment subject elevating mechanism, and treating device using the same App 20050000450 - Iizuka, Hachishiro | 2005-01-06 |
| Plasma treating device and substrate mounting table App 20040163762 - Iizuka, Hachishiro ; et al. | 2004-08-26 |
| Plasma processing device App 20040144492 - Ikeda, Taro ; et al. | 2004-07-29 |
| Sheet-fed treating device App 20040035530 - IIzuka, Hachishiro | 2004-02-26 |
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