Iimuro; Shunichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Iimuro; Shunichi.The latest application filed is for "processing system and method for performing high throughput non-plasma processing".

Company Profile

0.5.3

Iimuro; Shunichi - Burlington MA
Iimuro, Shunichi - Yamanashi JP
Iimuro; Shunichi - Yamanashi-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi-zone substrate temperature control system and method of operating Grant 8,343,280 - Iimuro January 1, 2	2013-01-01
Processing System And Method For Performing High Throughput Non-plasma Processing App 20080217293 - Iimuro; Shunichi	2008-09-11
Multi-zone substrate temperature control system and method of operating App 20070235134 - Iimuro; Shunichi	2007-10-11
Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon App 20040200804 - Sugiyama, Norikazu ; et al.	2004-10-14
Plasma processing method and plasma processing apparatus Grant 6,110,287 - Arai , et al. August 29, 2	2000-08-29
Plasma etching system and plasma etching method Grant 5,593,540 - Tomita , et al. January 14, 1	1997-01-14
Plasma etching system Grant 5,423,936 - Tomita , et al. June 13, 1	1995-06-13
Method of ashing layers, and apparatus for ashing layers Grant 4,812,201 - Sakai , et al. March 14, 1	1989-03-14

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