loadpatents
name:-0.00313401222229
name:-0.0040931701660156
name:-0.0011110305786133
Iimura; Seiji Patent Filings

Iimura; Seiji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Iimura; Seiji.The latest application filed is for "ozone-scavenging materials and processes for preparing them".

Company Profile
0.4.2
  • Iimura; Seiji - Kanagawa JP
  • Iimura; Seiji - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Ozone removing material and method for preparing the same
Grant 7,291,312 - Iimura , et al. November 6, 2
2007-11-06
Copper plating bath and plating method for substrate using the copper plating bath
Grant 6,800,188 - Hagiwara , et al. October 5, 2
2004-10-05
Ozone-scavenging materials and processes for preparing them
App 20040028575 - Iimura, Seiji ;   et al.
2004-02-12
Copper plating bath and plating method for substrate using the copper plating bath
App 20030106802 - Hagiwara, Hideki ;   et al.
2003-06-12
Dioxo piperazine compounds
Grant 4,316,024 - Iimura , et al. February 16, 1
1982-02-16
7-(Syn-.alpha.-alkoxy-iminofurylacetamido-3-(2-carboxyalkyl-2,3-dihy dro-s-triazolo[4,3-b]pyridazin-3-on-6-ylthiomethyl)-3-cephem-4-carboxylic acids
Grant 4,103,085 - Naito , et al. July 25, 1
1978-07-25

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