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name:-0.027216911315918
name:-0.014213085174561
name:-0.0056729316711426
IIMORI; Hiroyasu Patent Filings

IIMORI; Hiroyasu

Patent Applications and Registrations

Patent applications and USPTO patent grants for IIMORI; Hiroyasu.The latest application filed is for "substrate processing method and substrate processing apparatus".

Company Profile
5.13.24
  • IIMORI; Hiroyasu - Mie-ken JP
  • IIMORI; Hiroyasu - Nagoya JP
  • Iimori; Hiroyasu - Mie JP
  • IIMORI; Hiroyasu - Mie-gun JP
  • Iimori; Hiroyasu - Yokohama JP
  • Iimori; Hiroyasu - Yokohama-shi JP
  • Iimori; Hiroyasu - Kanagawa JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate Processing Method And Substrate Processing Apparatus
App 20220181171 - UOZUMI; Yoshihiro ;   et al.
2022-06-09
Semiconductor Manufacturing Apparatus And Manufacturing Method Of Semiconductor Device
App 20210066076 - IIMORI; Hiroyasu
2021-03-04
Substrate treatment apparatus and substrate treatment method
Grant 10,453,729 - Koide , et al. Oc
2019-10-22
Substrate Processing Method And Substrate Processing Apparatus
App 20190214277 - Uozumi; Yoshihiro ;   et al.
2019-07-11
Dust collecting apparatus, substrate processing system, and method of manufacturing semiconductor device
Grant 10,290,490 - Sugita , et al.
2019-05-14
Substrate Treatment Apparatus And Substrate Treatment Method
App 20190080947 - Koide; Tatsuhiko ;   et al.
2019-03-14
Substrate treatment apparatus and substrate treatment method
Grant 10,199,209 - Sugita , et al. Fe
2019-02-05
Substrate Treatment Apparatus And Manufacturing Method Of Semiconductor Device
App 20180233383 - ASHIDATE; Hiroaki ;   et al.
2018-08-16
Method of manufacturing semiconductor device and semiconductor manufacturing apparatus
Grant 9,514,952 - Iimori , et al. December 6, 2
2016-12-06
Method Of Manufacturing Semiconductor Device And Semiconductor Manufacturing Apparatus
App 20160071738 - Iimori; Hiroyasu ;   et al.
2016-03-10
Substrate processing method and substrate processing apparatus
Grant 9,213,242 - Uozumi , et al. December 15, 2
2015-12-15
Substrate Processing Method And Substrate Processing Apparatus
App 20130273744 - YAMADA; Hiroaki ;   et al.
2013-10-17
Substrate Processing Method And Substrate Processing Apparatus
App 20130008868 - UOZUMI; Yoshihiro ;   et al.
2013-01-10
Method of treating a semiconductor substrate
Grant 7,985,683 - Tomita , et al. July 26, 2
2011-07-26
Semiconductor Substrate Cleaning Method Using Bubble/chemical Mixed Cleaning Liquid
App 20110088731 - TOMITA; Hiroshi ;   et al.
2011-04-21
Method of treating surface of semiconductor substrate
Grant 7,838,425 - Tomita , et al. November 23, 2
2010-11-23
Method of treating a semiconductor substrate
App 20100240219 - Tomita; Hiroshi ;   et al.
2010-09-23
Etching Apparatus, A Method Of Controlling An Etching Solution, And A Method Of Manufacturing A Semiconductor Device
App 20100210110 - Okuchi; Hisashi ;   et al.
2010-08-19
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
Grant 7,776,756 - Okuchi , et al. August 17, 2
2010-08-17
Method of treating a semiconductor substrate
Grant 7,749,909 - Tomita , et al. July 6, 2
2010-07-06
Manufacturing method of semiconductor device using etching solution
Grant 7,727,871 - Tomita , et al. June 1, 2
2010-06-01
Method Of Treating A Semiconductor Substrate
App 20100075504 - Tomita; Hiroshi ;   et al.
2010-03-25
Substrate Treatment Apparatus And Substrate Treatment Method
App 20100044343 - Tomita; Hiroshi ;   et al.
2010-02-25
Filter, Substrate Treatment Apparatus And Substrate Treatment Method
App 20090317980 - Iimori; Hiroyasu ;   et al.
2009-12-24
Method Of Treating Surface Of Semiconductor Substrate
App 20090311874 - Tomita; Hiroshi ;   et al.
2009-12-17
Substrate Processing Apparatus And Substrate Processing Method
App 20090250431 - INUKAI; Minako ;   et al.
2009-10-08
Semiconductor Substrate Cleaning Method Using Bubble/chemical Mixed Cleaning Liquid
App 20080308132 - Tomita; Hiroshi ;   et al.
2008-12-18
Method of manufacturing semiconductor device
App 20080064212 - Ogawa; Yoshihiro ;   et al.
2008-03-13
Manufacturing method of semiconductor device and etching solution
App 20070224792 - Tomita; Hiroshi ;   et al.
2007-09-27
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
Grant 7,267,742 - Okuchi , et al. September 11, 2
2007-09-11
Etching method and apparatus for semiconductor wafers
App 20060255014 - Ogawa; Yoshihiro ;   et al.
2006-11-16
Etching method and apparatus for semiconductor wafers
Grant 7,097,784 - Ogawa , et al. August 29, 2
2006-08-29
Semiconductor substrate processing apparatus and semiconductor device fabrication method
App 20060081335 - Iimori; Hiroyasu ;   et al.
2006-04-20
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
App 20050230045 - Okuchi, Hisashi ;   et al.
2005-10-20
Filter, substrate treatment apparatus and substrate treatment method
App 20050211378 - Iimori, Hiroyasu ;   et al.
2005-09-29
Etching method and apparatus for semiconductor wafers
App 20040157452 - Ogawa, Yoshihiro ;   et al.
2004-08-12

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