Ihara; Daisuke
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ihara; Daisuke.The latest application filed is for "hafnium carbide powder for plasma electrodes, method for producing same, hafnium carbide sintered body, and plasma electrode".
- Ihara; Daisuke - Iruma-gun Saitama
- Ihara; Daisuke - Nishinomiya JP
- IHARA; Daisuke - Nishinomiya-shi JP
- Ihara; Daisuke - Mie JP
| Patent | Date |
|---|---|
| Hafnium Carbide Powder For Plasma Electrodes, Method For Producing Same, Hafnium Carbide Sintered Body, And Plasma Electrode App 20220185677 - Ihara; Daisuke ; et al. | 2022-06-16 |
| Liquid supply device Grant 10,294,929 - Watanabe , et al. | 2019-05-21 |
| Liquid Supply Device App 20160333870 - WATANABE; Kei ; et al. | 2016-11-17 |
| Rotary Dry Vacuum Pump App 20080038132 - Ihara; Daisuke ; et al. | 2008-02-14 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 