Igeta; Masanobu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Igeta; Masanobu.The latest application filed is for "systems and methods for improving planarity using selective atomic layer etching (ale)".

Company Profile

2.9.22

Igeta; Masanobu - Minato-ku Tokyo
IGETA; Masanobu - Tokyo JP
IGETA; Masanobu - Hillsboro OR
Igeta; Masanobu - Albany NY
Igeta; Masanobu - Fishkill NY
IGETA; Masanobu - Nirasaki-shi JP
Igeta; Masanobu - Nirasaki JP
Igeta; Masanobu - Yamanashi JP
Igeta, Masanobu - Nirasak-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Systems and Methods for Improving Planarity using Selective Atomic Layer Etching (ALE) App 20220037162 - O'Meara; David ; et al.	2022-02-03
Substrate Processing Method For Forming Inner Spacers In A Nano-sheet Device App 20210376123 - YAMAGUCHI; Shimpei ; et al.	2021-12-02
Fabrication Process Flow Of Dielectric Layer For Isolation Of Nano-sheet Devices On Bulk Silicon Substrate App 20210375684 - YAMAGUCHI; Shimpei ; et al.	2021-12-02
Ruthenium metal feature fill for interconnects Grant 10,700,009 - Yu , et al.	2020-06-30
Ruthenium Metal Feature Fill For Interconnects App 20190103363 - Yu; Kai-Hung ; et al.	2019-04-04
Film Forming Method and Film Forming Apparatus App 20160322218 - FUKIAGE; Noriaki ; et al.	2016-11-03
Film formation method, film formation apparatus and storage medium Grant 8,853,100 - Igeta , et al. October 7, 2	2014-10-07
Film Formation Method, Film Formation Apparatus And Storage Medium App 20140004713 - IGETA; Masanobu ; et al.	2014-01-02
Film forming method Grant 7,754,293 - Aoyama , et al. July 13, 2	2010-07-13
Method and system for forming an oxynitride layer Grant 7,501,352 - Igeta , et al. March 10, 2	2009-03-10
Plasma igniting method and substrate processing method Grant 7,497,964 - Igeta , et al. March 3, 2	2009-03-03
Radical Processing of a Sub-Nanometer Insulation Film App 20080139000 - IGETA; Masanobu ; et al.	2008-06-12
Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus Grant 7,378,358 - Igeta , et al. May 27, 2	2008-05-27
Method For Manufacturing Semiconductor Device, Substrate Treater, And Substrate Treatment System App 20070190802 - AOYAMA; SHINTARO ; et al.	2007-08-16
Method and system for forming a layer with controllable spstial variation App 20070066084 - Wajda; Cory ; et al.	2007-03-22
Multi-source method and system for forming an oxide layer App 20070065593 - Wajda; Cory ; et al.	2007-03-22
Substrate processing method and a computer readable storage medium storing a program for controlling same Grant 7,129,185 - Aoyama , et al. October 31, 2	2006-10-31
Method and device for processing substrate, and apparatus for manufacturing semiconductor device Grant 7,125,799 - Aoyama , et al. October 24, 2	2006-10-24
Film forming method App 20060234515 - Aoyama; Shintaro ; et al.	2006-10-19
Method and system for forming an oxynitride layer App 20060228902 - Igeta; Masanobu ; et al.	2006-10-12
Method and system for forming a high-k dielectric layer App 20060228898 - Wajda; Cory ; et al.	2006-10-12
Plasma igniting method and substrate processing method App 20060205188 - Igeta; Masanobu ; et al.	2006-09-14
Substrate treating apparatus and method of substrate treatment App 20060174833 - Yamazaki; Kazuyoshi ; et al.	2006-08-10
Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus App 20060009044 - Igeta; Masanobu ; et al.	2006-01-12
Radical processing of a sub-nanometer insulation film Grant 6,927,112 - Igeta , et al. August 9, 2	2005-08-09
Radical processing of a sub-nanometer insulation film App 20050170541 - Igeta, Masanobu ; et al.	2005-08-04
Substrate processing method and a computer readable storage medium storing a program for controlling same App 20050079720 - Aoyama, Shintaro ; et al.	2005-04-14
Method and device for processing substrate, and apparatus for manufacturing semiconductor device App 20040241991 - Aoyama, Shintaro ; et al.	2004-12-02
Method for film formation of gate insulator, apparatus for film formation of gate insulator, and cluster tool App 20040053472 - Kiryu, Hideki ; et al.	2004-03-18
Method for manufacturing semiconductor device, substrate treater, and substrate treatment system App 20040023513 - Aoyama, Shintaro ; et al.	2004-02-05
Radical processing of a sub-nanometer insulation film App 20030170945 - Igeta, Masanobu ; et al.	2003-09-11

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