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name:-0.0059988498687744
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Ieki; Toshihide Patent Filings

Ieki; Toshihide

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ieki; Toshihide.The latest application filed is for "plastic formed article having a vapor-deposited film by a plasma cvd method".

Company Profile
0.5.6
  • Ieki; Toshihide - Yokohama JP
  • Ieki; Toshihide - Kanagawa JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Vapor deposited film by plasma CVD method
Grant 7,906,217 - Inagaki , et al. March 15, 2
2011-03-15
Method of forming a metal oxide film and microwave power source device used for the above method
Grant 7,847,209 - Namiki , et al. December 7, 2
2010-12-07
Plastic Formed Article Having A Vapor-deposited Film By A Plasma Cvd Method
App 20090202762 - Yamada; Kouji ;   et al.
2009-08-13
Vapor Deposited Film by Plasma Cvd Method
App 20090148633 - Inagaki; Hajime ;   et al.
2009-06-11
Chemical vapor deposited film based on a plasma CVD method and method of forming the film
Grant 7,488,683 - Kobayashi , et al. February 10, 2
2009-02-10
Chemical vapor deposited film based on a plasma cvd method and method of forming the film
App 20060264044 - Kobayashi; Akira ;   et al.
2006-11-23
Method of forming a metal oxide film and microwave power source unit for use in the method
App 20060138099 - Namiki; Tsunehisa ;   et al.
2006-06-29
Silicon oxide film
Grant 6,818,310 - Namiki , et al. November 16, 2
2004-11-16
Silicon oxide membrane
App 20030165696 - Namiki, Tsunehisa ;   et al.
2003-09-04
Method of treatment with a microwave plasma
Grant 6,582,778 - Namiki , et al. June 24, 2
2003-06-24
Method of treatment with a microwave plasma
App 20020122897 - Namiki, Tsunehisa ;   et al.
2002-09-05

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