Hwang; Ming

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hwang; Ming.The latest application filed is for "controllable oxidation technique for high quality ultra-thin gate oxide".

Company Profile

0.9.1

Hwang; Ming - Dallas TX
Hwang; Ming - Richardson TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Selective oxidation for semiconductor device fabrication Grant 6,835,672 - Park , et al. December 28, 2	2004-12-28
Method to protect metal from oxidation during poly-metal gate formation in semiconductor device manufacturing Grant 6,245,605 - Hwang , et al. June 12, 2	2001-06-12
Rapid and selective heating method in integrated circuit package assembly by means of tungsten halogen light source Grant 6,234,374 - Hwang , et al. May 22, 2	2001-05-22
Controllable oxidation technique for high quality ultra-thin gate oxide App 20010001074 - Hwang, Ming ; et al.	2001-05-10
CVD-based process for manufacturing stable low-resistivity poly-metal gate electrodes Grant 6,187,656 - Lu , et al. February 13, 2	2001-02-13
Low resistivity poly-silicon gate produced by selective metal growth Grant 6,184,129 - Hwang , et al. February 6, 2	2001-02-06
Stable and low resistance metal/barrier/silicon stack structure and related process for manufacturing Grant 6,100,188 - Lu , et al. August 8, 2	2000-08-08
Optical curing process for intergrated circuit package assembly Grant 5,846,476 - Hwang , et al. December 8, 1	1998-12-08
Optical diebonding for semiconductor devices Grant 5,783,025 - Hwang , et al. July 21, 1	1998-07-21
In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing Grant 5,705,232 - Hwang , et al. January 6, 1	1998-01-06

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